Void formation in charge trap structures

ABSTRACT

Electronic apparatus and methods of forming the electronic apparatus may include one or more charge trap structures for use in a variety of electronic systems and devices, where each charge trap structure includes a dielectric barrier between a gate and a blocking dielectric on a charge trap region of the charge trap structure. In various embodiments, a void is located between the charge trap region and a region on which the charge trap structure is disposed. In various embodiments, a tunnel region separating a charge trap region from a semiconductor pillar of a charge trap structure, can be arranged such that the tunnel region and the semiconductor pillar are boundaries of a void. Additional apparatus, systems, and methods are disclosed.

PRIORITY APPLICATION

This application is a divisional of U.S. application Ser. No.15/675,265, filed Aug. 11, 2017, which is incorporated herein byreference in its entirety.

BACKGROUND

The electronics industry is under constant pressure to both reducecomponent size as well as power requirements and has a market drivenneed to improve operation of memory devices. One approach to reducecomponent size is to fabricate devices in a three-dimensional (3D)configuration. For example, a memory device can be arranged as a stackof memory cells vertically on a substrate. Such memory cells can beimplemented as charge trap cells. Improvements to charge trap basedmemory devices and their operation can be addressed by advances indesign and processing of the memory devices.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a cross-sectional representation of an example charge trapstructure, according to various embodiments.

FIG. 1B is a representation of an example of a void structure for theexample charge trap structure of FIG. 1A, according to variousembodiments.

FIG. 2A is a cross-sectional representation of an example charge trapstructure, according to various embodiments.

FIG. 2B is a representation of an example of a void structure for theexample charge trap structure of FIG. 2A, according to variousembodiments.

FIG. 3 is a schematic diagram of an example of a block architecture andpage address mapping of a memory array of a three-dimensional memorydevice, according to various embodiments.

FIG. 4 is a cross-sectional representation of an example of a number ofcharge trap structures in a vertical string of a memory device,according to various embodiments.

FIG. 5 is a cross-sectional representation of an example of a number ofcharge trap structures in a vertical string of a memory device,according to various embodiments.

FIG. 6 is a flow diagram of features of an example method of forming acharge trap structure, according to various embodiments.

FIG. 7 is a flow diagram of features of an example method of formingmultiple charge trap structures in a stack, according to variousembodiments.

FIG. 8 is a flow diagram of features of an example method of formingmultiple charge trap structures in a stack, according to variousembodiments.

FIGS. 9A-9R are cross-sectional views illustrating stages of an examplemethod of forming charge trap structures, according to variousembodiments.

FIGS. 10A-10D are cross-sectional views illustrating stages of anexample method of forming charge trap structures, according to variousembodiments.

FIG. 11 is a representation of an example wafer having multiple die,according to various embodiments.

FIG. 12 is a block diagram of an example system that includes a memorystructured with an array of charge trap structures as memory cells,according to various embodiments.

DETAILED DESCRIPTION

The following detailed description refers to the accompanying drawingsthat show, by way of illustration, various embodiments of the invention.These embodiments are described in sufficient detail to enable those ofordinary skill in the art to practice these and other embodiments. Otherembodiments may be utilized, and structural, logical, and electricalchanges may be made to these embodiments. The various embodiments arenot necessarily mutually exclusive, as some embodiments can be combinedwith one or more other embodiments to form new embodiments. Thefollowing detailed description is, therefore, not to be taken in alimiting sense.

The term “horizontal” as used in this document is defined as a planeparallel to the conventional plane or surface of a substrate, such asthat underlying a wafer or die, regardless of the actual orientation ofthe substrate at any point in time. The term “vertical” refers to adirection perpendicular to the horizontal as defined above. The terms“wafer” and “substrate” are used herein to refer generally to anystructure on which integrated circuits are formed, and also to suchstructures during various stages of integrated circuit fabrication. Awafer may include a number of die in which an integrated circuit isdisposed with respect to a respective substrate of the die.

FIG. 1A is a cross-sectional representation of an embodiment of anexample charge trap (CT) structure 101, which can be included in avariety of electronic apparatus. Such apparatus can include a memoryarray, a memory device, an integrated circuit, or other apparatus thatincludes one or more cells to store charge. The CT structure 101 caninclude a semiconductor pillar 103, a charge trap region 105, a tunnelregion 107, a dielectric blocking region 109, a dielectric barrier 110,and a gate 115. Dielectric barrier 110 is disposed between andseparating dielectric blocking region 109 and gate 115. Dielectricbarrier 110 can be disposed in a vertical arrangement with dielectricblocking region 109 and charge trap region 105 such that a void islocated in a region between a surface on which CT structure 101 isdisposed and one or more of dielectric barrier 110, dielectric blockingregion 109, or charge trap region 105. A void in a structure is a regionof the structure without solid material and without liquid material. Avoid may be in the form of an evacuated region, an air gap, a gas-filledregion, or similar construction. An air gap in a structure or betweenstructures is a gap or region that is filled with air. Herein, the termair gap may include ambient gases enclosed in the gap, such as duringformation of the gap.

Dielectric barrier 110 can be disposed in a vertical arrangement withdielectric blocking region 109 and charge trap region 105 in whichcharge trap region 105 is recessed vertically with respect to dielectricblocking region 109 in a void 120. For example, a distance between thecharge trap region and the region on which the charge trap structure isdisposed can be greater than a distance between the dielectric blockingregion and the region on which the charge trap structure is disposed. Invarious embodiments, dielectric blocking region 109 can be recessed invoid 120 vertically with respect to dielectric barrier 110 and/or thegate 115. For example, the distance between the dielectric blockingregion and the region on which the charge trap structure is disposed canbe greater than a distance between the dielectric barrier and the regionon which the charge trap structure is disposed. Void 120, dielectricblocking region 109, and charge trap region 105 can be structured suchthat a ratio of vertical thickness of charge trap region 105 to verticalthickness of dielectric blocking region 109 and size of void 120 can beselected to attain a capacitance associated with gate 115 within aspecified range.

In various embodiments, arrangements of CT structure 101 with aconductive region 113 can have a number of different structuralarrangements. CT structure 101 can be separated from conductive region113 by an access transistor that can be a transistor structure differentfrom a CT that can operatively act as a transmission gate to provideoperational coupling of conductive region 113 to CT structure 101. CTstructure 101 can be separated from conductive region 113 by a number ofsuch access transistors. In some structures, semiconductor pillar 103 ofCT 101 may be coupled to and integrated in the one or more accesstransistors such that coupling of semiconductor pillar 103 withconductive region 113 is made by channels of the access transistors towhich semiconductor pillar 103 is integrated.

A portion of dielectric barrier 110 can extend vertically below a bottomsurface of gate 115 as a protrusion 110-1, which may be referred to as afin 110-1. Fin 110-1 is a. component of dielectric barrier 110 thatprovided a mechanism to form void 120 and can remain in the completed CTstructure 101. Alternatively, after forming an opening to structureboundaries of void 120, fin 110-1 may be removed or significantlyreduced, leaving dielectric barrier 110 confined to regions directlybetween gate 115 and dielectric blocking region 109.

Charge trap structure 101 is disposed above conductive region 113 thatis located on a substrate 102. In FIG. 1A, a space is shown between thebottom of charge trap structure 101 and conductive region 113 toindicate that there may be additional materials and/or integratedcircuit structures between charge trap structure 101 and conductiveregion 113, as noted above. An isolation region or other integratedcircuit structures can separate components of the charge trap structure101 from conductive region 113. Alternatively, the CT structure 101 canbe disposed on conductive region 113, without a separation or couplingregion, with gate 115 separated from conductive region 113 by a sealingdielectric 122. As noted above, CT structure 101 can be disposed aboveconductive region 113 with gate 115 separated from an access transistor,which couples CT structure 101 to conductive region 113, by sealingdielectric 122.

Sealing dielectric 122 is a region for CT structure 101 used to seal offvoid 120 during processing of different areas of the electronicapparatus in which CT structure 101 is integrated, where portions ofsealing dielectric 122 remain in the completed structure, continuing toseal void 120. Void 120 can be contained within a region bounded bytunnel region 107, charge trap region 105, dielectric barrier 110,sealing dielectric 122, and a region on which CT structure 101 isdisposed and/or conductive region 113, where sealing dielectric 122 isdisposed on portions of gate 115. With CT structure 101 arranged withoutfin 110-1, the extent of sealing dielectric 122, as a boundary of void120, toward tunnel region 107 can be limited by the process to formsealing dielectric 122. The figures herein are not drawn to scale.Further, electrical connections of gate 115, semiconductor pillar 103,and conductive region 113 to other components of an apparatus, in whichCT structure 101 is integrated, are not shown to focus on the CTstructure 101.

Semiconductor pillar 103 is operable to conduct a current and gate 115is operable to control storage of charge in the charge storage region105. Gate 115 can be a metal gate. Gate 115 can include combinations ofmetals and metallic compounds. Gate 115 is conductive and can include,but is not limited to, conductive titanium nitride and/or tungsten. Forexample, gate 115 include a conductive titanium nitride region 115-1 onwhich a tungsten region 115-2 is disposed. Gate 115 can be referred toas a control gate and dielectric blocking region 109 can be referred toas a control dielectric. Semiconductor pillar 103 can includesemiconductor material such as, but not limited to polycrystallinesilicon (poly silicon). The semiconductor material of semiconductorpillar 103 may have a majority carrier concentration that is less thanthe majority carrier concentration of conductive region 113, withconductive region 113 structured as a semiconductor region. Thedifference in majority carrier concentration can be orders of magnitudein powers of base 10. The regions of structure 101 shown in FIG. 1A canbe arranged as rings of material around center region 104. Center region104 can be a dielectric. Center region 104 can be a region of dielectricmaterial, such as, but not limited to, a dielectric oxide. An example ofa dielectric oxide in center region 104 can include, but is not limitedto, silicon oxide.

Charge trap region 105 is separated from the semiconductor pillar 103 bya tunnel region 107. Charge trap region 105 can be a dielectric materialthat can store charge from semiconductor pillar 103. Charge trap region105 can be a dielectric nitride region such as a region includingdielectric silicon nitride. Other dielectric materials for charge trapregion 105 can be used to trap charge. Tunnel region 107 can beconstructed as an engineered region to meet a selected criterion, suchas, for example but not limited to, an equivalent oxide thickness (EOT).The EOT quantifies the electrical properties of tunnel region 107, suchas capacitance, of a dielectric in terms of a representative physicalthickness. For example, EOT can be defined as the thickness of atheoretical SiO₂ layer that would be required to have the samecapacitance density as a given dielectric (tunneling region 107),ignoring leakage current and reliability considerations. Tunnel region107 can include an oxide and a nitride. Tunnel region can include ahigh-κ dielectric, where κ is a dielectric constant. A high-κ dielectricis a dielectric with a dielectric constant greater than the dielectricconstant of silicon dioxide.

Tunnel region 107 may include a set of dielectric barriers. The examplein FIG. 1A shows tunnel region 107 being a three region tunnel barrier.The three region tunnel barrier can be arranged as a region ofdielectric oxide followed by a region of dielectric nitride followed byanother region of dielectric oxide. Alternatively, tunnel region 107 canbe a two region tunnel barrier or a one region tunnel barrier. Further,tunnel region 107 may have four or more regions, where the selection ofmaterial and thicknesses depends on the capability of the material withthe given thicknesses to perform as a tunneling region to charge trapregion 105.

Dielectric blocking region 109 is disposed adjacent to and contactingcharge trap region 105. Dielectric blocking region 109 provides amechanism to block charge from flowing from charge trap region 105 togate 115. Dielectric blocking region 109 can be an oxide or otherdielectric such as used in tunnel region 107. Gate 115 is disposed ondielectric blocking region 109, but separated from dielectric blockingregion 109 by dielectric barrier 110 that is between dielectric blockingregion 109 and gate 115, where the material of dielectric barrier 110 isdifferent from the material of dielectric blocking region 109.

Dielectric barrier 110, structured as a thin region, between dielectricblocking region 109 and gate 115 enables an enhanced tunneling barrierthat prevents back-tunneling of electrons from gate 115 throughdielectric blocking region 109 into charge trap region 105, which canthereby limit operational erase saturation to small positive or smallnegative threshold voltage (V_(t)) levels. Dielectric barrier 110 canhave a thickness in the range from about 15 angstroms to about 50angstroms between dielectric blocking region 109 and gate 115. Selectionof material for dielectric barrier 110 can be based on the fabricationof CT structure 101. For example, in a process in which CT structure 101including void 120 is formed by removing of material from areas to thesides of what is to become CT structure 101, the material for dielectricbarrier 110 can be selected such that the material for dielectricbarrier 110 resists removal at the processing chemistries andtemperatures used in removal of materials from the sides of CT structure101. The material for dielectric barrier 110 can act as a mask toprevent removal of dielectric blocking region 109 in such removalprocesses in formation of CT structures like CT structure 101.

Dielectric barrier 110 can be realized as an AlO_(x) region or adielectric region having a higher dielectric constant than AlO_(x). (Useof nomenclature AB_(x) indicates an AB material that is not limited to aparticular stoichiometry for the AB compound.) Dielectric barrier 110can have an electron affinity lower than that aluminum oxide. Dielectricbarrier 110 can include one or more of aluminum oxide, hafnium oxide,zirconium oxide, or mixtures of hafnium oxide and/or zirconium oxidewith one or more of aluminum oxide, silicon oxide, titanium oxide,gadolinium oxide, niobium oxide, or tantalum oxide. Examples of filmsthat can be used include HfO₂ and/or ZrO₂ based materials, as well asmixtures with other materials such as AlO_(x), SiO₂, TiO₂, GaO_(x),NbO_(x), and Ta₂O₅. Such materials may not be limited to a particularstoichiometry. Other high-κ dielectrics can be used for dielectricbarrier 110.

FIG. 1B is an illustration of CT 101 of FIG. 1A in which sealingdielectric 122 is limited in the direction towards tunnel region 107,defining a boundary of void 120. Sealing dielectric 122 may formed by asealing process that can be implemented using plasma-enhanced chemicalvapor deposition (PECVD) or other depleting process. In such depletingprocesses, the bulk of sealing dielectric is formed at an opening of a.passageway with the material of the sealing dielectric decreasing in thepassageway along the surfaces of the passageway. The extent ofdisposition along the passageway depends on a number of factors, whichincludes the area of the opening of the passageway. As shown in FIG. 1B,sealing dielectric 122 can terminate in a region below gate 115,resulting in two voids. Void 120-1 is under gate 115 and void 120 isunder dielectric blocking region 109 and charge trap region 105. In CTstructures 110 with fin 110-1 of dielectric barrier 110 removed, voids120-1 and 120 together form a larger void.

FIG. 2A is a cross-sectional representation of an embodiment of anexample CT structure 201, which can be included in a variety ofelectronic apparatus. Such apparatus can include a memory array, amemory device, an integrated circuit, or other apparatus that includesone or more cells to store charge. The CT structure 201 can include asemiconductor pillar 203, a charge trap region 205, a tunnel region 207,a dielectric blocking region 209, a dielectric barrier 210, and a gate215, with a void 220 located in a region between a surface on which CTstructure 201 is disposed and one or more of dielectric barrier 210,dielectric blocking region 209, charge trap region 205, or tunnel region207. CT structure 201 can be structured with tunnel region 207 as partof boundaries of void 220 and semiconductor pillar 203 arranged as avertical boundary of the boundaries of void 220. Dielectric barrier 210is disposed between and separating dielectric blocking region 209 andthe gate 215, and can be disposed in a vertical arrangement withdielectric blocking region 209, charge trap region 205, and tunnelregion 207 in which dielectric blocking region 209, charge trap region205, and tunnel region 207 in an arrangement with semiconductor pillar203 can be arranged as boundaries of void 220. Dielectric barrier 210along with dielectric blocking region 209 and charge trap region 205 canbe arranged as boundaries of void 220.

In various embodiments, arrangements of CT structure 201 with aconductive region 213 can have a number of different structuralarrangements. CT structure 201 can be separated from conductive region113 by an access transistor that can be a transistor structure differentfrom a CT that can operatively act as a transmission gate to provideoperational coupling of conductive region 213 to CT structure 201. CTstructure 201 can be separated from conductive region 213 by a number ofsuch access transistors. In some structures, semiconductor pillar 203 ofCT 201 may be coupled to and integrated in the one or more accesstransistors such that coupling of semiconductor pillar 203 withconductive region 213 is made by channels of the access transistors towhich semiconductor pillar 203 is integrated.

A portion of dielectric barrier 210 can extend vertically below a bottomsurface of gate 215 as a fin 210-1. Fin 210-1 is a component ofdielectric barrier 210 that provided a mechanism to form void 220 andcan remain in the completed CT structure 201. Alternatively, afterforming an opening to structure boundaries of void 220, fin 210-1 may beremoved or significantly reduced, leaving dielectric barrier 210substantially confined to regions directly between gate 215 anddielectric blocking region 209.

Charge trap structure 201 is disposed above conductive region 213 thatis located on a substrate 202. In FIG. 2A, a space is shown between thebottom of charge trap structure 201 and conductive region 213 toindicate that there may be additional materials and/or integratedcircuit structures between charge trap structure 201 and conductiveregion 213, as noted above. An isolation region or other integratedcircuit structures can separate components of the charge trap structure201 from conductive region 213. Alternatively, the CT structure 201 canbe disposed on conductive region 213, without a separation or couplingregion, with gate 215 separated from conductive region 213 by a sealingdielectric 222. As noted above, CT structure 201 can be disposed aboveconductive region 213 with gate 215 separated from an access transistor,which couples CT structure 201 to conductive region 213, by sealingdielectric 222.

Sealing dielectric 222 is a region for CT structure 201 used to seal offvoid 220 during processing of different areas of the electronicapparatus in which CT structure 201 is integrated, where portions ofsealing dielectric 222 remain in the completed structure, continuing toseal void 220. Void 220 can be contained within a region bounded bysemiconductor pillar 203 and bounded by tunnel region 207, charge trapregion 205, dielectric barrier 210, sealing dielectric 222, and a regionon which CT structure 201 is disposed and/or conductive region 213,where sealing dielectric 222 is disposed on portions of gate 215. WithCT structure 201 arranged without fin 210-1, the extent of sealingdielectric 222, as a boundary of void 220, toward semiconductor pillar203 can be limited by the process to form sealing dielectric 222.Further, electrical connections of gate 215, semiconductor pillar 203,and conductive region 213 to other components of an apparatus, in whichCT structure 201 is integrated, are not shown to focus on CT structure201.

Semiconductor pillar 203 is operable to conduct a current and gate 215is operable to control storage of charge in the charge storage region205. Gate 215 can be a. metal gate. Gate 215 can include combinations ofmetals and metallic compounds. Gate 215 is conductive and can include,but is not limited to, conductive titanium nitride and/or tungsten. Forexample, gate 215 can include a conductive titanium nitride region 215-1on which a tungsten region 215-2 is disposed. Semiconductor pillar 203can include, but not limited to polycrystalline silicon (poly silicon).The semiconductor material of semiconductor pillar 203 may have amajority carrier concentration that is less than the majority carrierconcentration of conductive region 213, with conductive region 213structured as a semiconductor region. The difference in majority carrierconcentration can be orders of magnitude in powers of base 10.

Semiconductor pillar 203 associated with CT structure 201 can beconsidered to have two sections. One section is adjacent to andcontacting tunnel region 207 and the other section is adjacent to and isa boundary of void 220. Semiconductor pillar 203 can include highercarrier doping levels in a region 223 of semiconductor pillar 203bounded by void 220 than in regions of semiconductor pillar 203 boundedby tunnel region 207. The higher doping levels in region 223 can bedistributed as a gradient along a vertical length of semiconductorpillar 203 with respect to the carrier concentration of semiconductorpillar 203 bounded by tunnel region 207. Such a gradient may be realizedwith an excess of majority carrier concentration, relative to doping ofalong semiconductor pillar 203 bounded by tunnel region 207, approachingzero at the beginning of the boundary of semiconductor pillar 203 withtunnel region 207. This dopant gradient can enhance control of gate 215on semiconductor pillar 203. The higher carrier doping levels can ben-type doping. Alternatively, with semiconductor doping in the varioussections of CT structure 201 being p-type, the higher carrier dopinglevels can be p-type doping. Charge trap structure 201 may be arrangedas one of a number of substantially identically structured charge trapstructures arranged in a vertical stack such that the tunnel region ofone charge trap structure is separated from the tunnel region of anadjacent charge trap structure in the vertical stack by a void, withhigher carrier doping levels in regions of the semiconductor pillar 203between adjacent charge trap structures.

The regions of structure 201 shown in FIG. 2A can be arranged as ringsof material around center region 204. Center region 204 can be adielectric. Center region 204 can be a region of dielectric material,such as, but not limited to, a dielectric oxide. An example of adielectric oxide in center region 204 can include, but is not limitedto, silicon oxide.

Charge trap region 205 is separated from the semiconductor pillar 203 bya tunnel region 207. Charge trap region 205 can be a dielectric materialthat can store charge from semiconductor pillar 203. Charge trap region205 can be a dielectric nitride region such as a region includingdielectric silicon nitride. Other dielectric materials for charge trapregion 205 can be used to trap charge. Tunnel region 207 can beconstructed as an engineered region to meet a selected criterion, suchas, for example but not limited to, an equivalent oxide thickness (EOT).Tunnel region 207 can include an oxide and a nitride. Tunnel region 207may include a set of dielectric barriers. The example in FIG. 2A showstunnel region 207 being a three region tunnel barrier. The three regiontunnel barrier can be arranged as a region of dielectric oxide followedby a region of dielectric nitride followed by another region ofdielectric oxide. Alternatively, tunnel region 207 can be a two regiontunnel barrier or a one region tunnel barrier. Further, tunnel region207 may have four or more regions, where the selection of material andthicknesses depends on the capability of the material with the giventhicknesses to perform as a tunneling region to charge trap region 205.

Dielectric blocking region 209 is disposed adjacent to and contactingcharge trap region 205. Dielectric blocking region 209 provides amechanism to block charge from flowing from charge trap region 205 togate 215. Dielectric blocking region 209 can be an oxide or otherdielectric such as used in tunnel region 207. Gate 215 is disposed ondielectric blocking region 209, but separated from dielectric blockingregion 209 by dielectric barrier 210 that is between dielectric blockingregion 209 and gate 215, where the material of dielectric barrier 210 isdifferent from the material of dielectric blocking region 209.

Dielectric barrier 210 can have a thickness in the range from about 15angstroms to about 50 angstroms between dielectric blocking region 209and gate 215. Selection of material for dielectric barrier 210 can bebased on the fabrication of CT structure 201. For example, in a processin which CT structure 201 including void 220 is formed by removing ofmaterial from areas to the sides of what is to become CT structure 201,the material for dielectric barrier 210 can be selected such that thematerial for dielectric barrier 210 resists removal at the processingchemistries and temperatures used in removal of materials from the sidesof CT structure 201. Dielectric barrier 210 can include dielectricmaterial different from material of dielectric blocking region 209 suchthat the dielectric material of the dielectric barrier 210 is capable ofwithstanding material processing for formation of gate 215 and removalof portions of charge trap region 205 and dielectric blocking region 209to form void 220. The material for dielectric barrier 210 can act as amask to prevent removal of dielectric blocking region 209 in suchremoval processes in formation of CT structures like CT structure 201.

Dielectric barrier 210 can be realized as an AlO_(x) region or adielectric region having a higher dielectric constant, κ, than AlO_(x).Dielectric barrier 210 can have an electron affinity lower than thataluminum oxide. Dielectric barrier 210 can include one or more ofaluminum oxide, hafnium oxide, zirconium oxide, or mixtures of hafniumoxide and/or zirconium oxide with one or more of aluminum oxide, siliconoxide, titanium oxide, gadolinium oxide, niobium oxide, or tantalumoxide. Examples of films that can be used include HfO₂ and/or ZrO₂ basedmaterials, as well as mixtures with other materials such as AlO_(x),SiO₂, TiO₂, GaO_(x), NbO_(x), and Ta₂O₅. Such materials may not belimited to a particular stoichiometry. Other high-κ dielectrics can beused for dielectric barrier 210.

FIG. 2B is an illustration of CT 201 of FIG. 2A in which sealingdielectric 222 is limited in the direction towards semiconductor pillar203, defining a boundary of void 220. Sealing dielectric 222 may formedby a sealing process that can be implemented using plasma-enhancedchemical vapor deposition (PECVD) or other depleting process. In suchdepleting processes, the bulk of sealing dielectric is formed at anopening of a passageway with the material of the sealing dielectricdecreasing in the passageway along the surfaces of the passageway. Theextent of disposition along the passageway depends on a number offactors, which includes the area of the opening of the passageway. Asshown in FIG. 2B, sealing dielectric 222 can terminate in a region belowgate 215, resulting in two voids. Void 220-1 is under gate 215 and void220 is under dielectric blocking region 209, charge trap region 105, andtunnel region 207. In CT structures 210 with fin 210-1 of dielectricbarrier 210 removed, voids 220-1 and 220 together form a larger void.

In various embodiments, a memory device can be structured as a memorystructure in which memory cells to store charge are arranged indifferent levels in a 3D structure. For example, the memory device caninclude a 3D NAND stack in which memory cells similar to CT structure101 or CT structure 201 can be arranged. A NAND array architecture canbe arranged as an array of memories (e.g., memory cells) arranged suchthat the memories of the array are coupled in logical rows to accesslines. The access lines may be word lines. Memories of the array can becoupled together in series between common regions, such as source lines,and data lines. The data lines may be bit lines.

The 3D NAND stack can be implemented with a dielectric barrier, such asdielectric barrier 110 or dielectric barrier 210, using materials forthe dielectric barrier selected to enable processing of voids between CTstructures arranged in the 3D NAND stack. Within CT cells in the 3D NANDstack, the gate of each such CT cell, which may be coupled to an accessline, for example a word line, or formed as part of the access line, canbe formed in a process in which an initially formed region, havingmaterial such as silicon nitride, is removed and replaced by aconductive gate in a number of CT cells in a vertical string in thestack. Such gates may be referred to as replacement gates.

FIG. 3 is a schematic diagram of an embodiment of an example of a blockarchitecture and page address mapping of a memory array 312 of a 3Dmemory device 300. Memory device 300 can be realized in the form of a 3DNAND memory device 300. Memory device 300 can comprise multiple verticalstrings 311 of charge storage devices 301. In the Z direction shown inFIG. 3, each string 311 of charge storage devices can comprise multiplestorage devices 301 stacked over one another with each charge storagedevice 301 corresponding to one of multiple tiers. For example, as shownin FIG. 3, thirty-two charge storage devices are stacked over oneanother in a string with each charge storage device 301 corresponding toone of thirty-two tiers shown as Tier0-Tier31. The number of storagedevices and tiers in the Z direction are not limited to thirty-two. Thecharge storage devices 301 of a respective string 311 may share a commonchannel region, such as one formed in a respective pillar ofsemiconductor material (e.g., polysilicon) about which the string ofcharge storage devices are formed. The pillars may be polysilicon,monocrystalline silicon, or other semiconductor structure in whichtransistors can be fabricated.

In the X direction shown in FIG. 3, sixteen groups of strings maycomprise eight strings that share thirty two access lines, CGs. Each ofthe access lines CGs may couple (e.g., electrically or otherwiseoperatively connect) the charge storage devices 301 corresponding to arespective tier of each string 311 of a corresponding one of the eightstrings. The charge storage devices 301 coupled by the same access line,CG, (and thus corresponding to the same tier) may be logically groupedinto, for example, two pages, such as P0/P32, P1/P33, P2/P34 and so on,when each charge storage device comprise a multi-level cell capable ofstoring multiple bits of information, Memory device 300 can be arrangedto operate each charge storage device as a quad level cell. The pageaddress mapping counts up horizontally in the same tier.

In the Y direction shown in FIG. 3, eight groups of strings can comprisesixteen strings coupled to a corresponding one of eight data lines(BLs). The structure with respect to the SGSs in this example is oneplate 394, which connects 16 pillar strings together, and the structurewith respect to the CGs is one plate 393, which connects 16 pillarstrings together. The SGD is separated by one pillar string. The numberof the strings, tiers, access lines, data lines, groups of strings ineach direction, and/or pages may be greater or smaller than those shownin FIG. 3.

The vertical strings 311 can include a pillar of semiconductor materialwith a number of charge storage devices 301 arranged along each verticalstring. Each charge storage device 301 can include a charge trap regionseparated from the pillar of a respective vertical string by a tunnelregion; a dielectric blocking region on the charge trap region; a gateon the dielectric blocking region to control storage of charge in thecharge storage region, the gate coupled to an access line; and adielectric barrier between the dielectric blocking region and the gate,with a void located between one or more of the dielectric barrier, thedielectric blocking region, the charge trap region, or tunnel region ofcharge storage device 301 and an adjacent charge storage device 301. Inan arrangement, charge storage device 301 can be structured with itscharge trap region recessed vertically with respect to its dielectricblocking region in the void and its tunneling region arranged as avertical boundary of the boundaries of the void. In another arrangement,charge storage device 301 can be structured with its tunnel region aspart of upper boundaries of the void and its channel arranged as avertical boundary of the boundaries of the void. A number of otherstructures of charge storage device 301 can be realized with differentones or combinations of its dielectric barrier, the dielectric blockingregion, the charge trap region, tunnel region, and channel arranged as avertical boundary of a void associated with charge storage device 301.

In various embodiments in which a channel, structured as a pillar ofsemiconductor material, is common to all charge storage devices 301 instring 311, the common channel can include higher carrier doping levelsin a region of the channel between adjacent charge storage devices 301bounded by a void than in regions of the common channel bounded by thetunnel region of each charge storage devices 301. The higher carrierdoping levels can be realized as a doping gradient between adjacentcharge storage devices 301. The doping gradient may include a gradientacross the common channel along the common channel between adjacentcharge storage devices 301. The gate of each charge storage device 301can be coupled to or integrated with an access line CG corresponding tothe location in memory array 312 of the respective charge storage device301. Charge storage device 301 may be realized in a manner similar to aCT structure associated with FIGS. 1A, 1B, 2A, and 2B.

The components of charge storage device 301 can be implemented byselecting properties from a number of different parameters. Thedielectric barrier of charge storage device 301 can include one or moreof aluminum oxide, hafnium oxide, zirconium oxide, or mixtures ofhafnium oxide and/or zirconium oxide with one or more of aluminum oxide,silicon oxide, titanium oxide, gadolinium oxide, niobium oxide, ortantalum oxide. Other high-κ dielectrics can be used for the dielectricbarrier. The dielectric barrier can have a thickness in a range fromabout 15 angstroms to about 50 angstroms from the dielectric blockingregion to the gate of charge storage device 301.

The tunnel region of charge storage device 301 can be implemented as athree region tunnel barrier. Such a three region tunnel barrier can beimplemented as a region of dielectric oxide followed by a region ofdielectric nitride followed by another region of dielectric oxide. Thetunnel region of charge storage device 301 can be implemented as amultiple region barrier other than three regions. Such a multiple regionbarrier can be implemented such that the selection of material andthicknesses of the regions depends on the capability of the materialwith the given thicknesses to perform a tunneling region to the chargetrap region of charge storage device 301. The gate of charge storagedevice 301 can be implemented as a metal gate or a gate including acombination of metal and metallic compounds. The channel of chargestorage device 301 in a string 311 can be implemented as a poly siliconchannel.

FIG. 4 is a cross-sectional representation of an embodiment of a numberof CT structures, for example CT structures 401-1, 401-2, and 401-3, ina vertical string 411 of a memory device 400. Vertical string 411 can beone of multiple strings of a memory array of a 3D memory. An example ofa 3D memory device with multiple vertical strings is shown in FIG. 3.Other 3D memory devices with multiple vertical strings can be structuredwith CT memory cells, similar to CT structures 101 of FIG. 1A or 1B.Other vertical strings in a 3D memory device can be structured similarto vertical string 411, arranged with different sets of electricalconnections.

Vertical string 411 includes a pillar 403 of semiconductor materialcoupled to and part of CT structures 401-1, 401-2, and 401-3. Memorydevice 400 is not limited to three CT structures in a vertical string.FIG. 4 shows three CT structures to focus on the architecture of CTstructures arranged in a vertical stack 406 along or as part of verticalstring 411. Vertical string 411 can be include more than three CTstructures, for example, 8, 16, 32, 64, or other number of CT structurescoupled to pillar 403 of vertical string 411 depending on the memorysize of memory device 400 or other factors for an architecture formemory device 400. Each CT structure can be arranged as a memory cell ofa string, where each CT structure is at a different vertical level thanthe other CT structures of the string, which each vertical level is atier of the memory array of the memory device.

Stack 406 can be supported by a base 416. In FIG. 4, a space is shownbetween the bottom of stack 406 and base 416 to indicate that there maybe additional materials and/or integrated circuit structures betweenbase 416 and stack 406. In various applications, such additionalintegrated materials may include, for example, a source-side selecttransistor material. Base 416 may include a conductive region 413 on asubstrate 402. Depending on the architecture of memory device 400,conductive region 413 may be a source region. Conductive region 413 mayinclude semiconductor material. The semiconductor material may include,but is not limited to, monocrystalline silicon or polycrystallinesilicon. Substrate 402 may be a semiconductor substrate or a substratehaving a combination of semiconductor material and insulating material.

CT structure 401-1 is arranged as a first charge trap structure alongvertical string 411, above which charge trap structures 401-2 and 401-3are arranged in vertical stack 406 with each of charge trap structures401-2 and 401-3 disposed above another CT structure of vertical stack406. The semiconductor material of pillar 403 is arranged as a pillar403-1, 403-2, and 403-3 for CT structures 401-1, 401-2, and 401-3,respectively. Each of CT structures 401-1, 401-2, and 401-3 includes atunnel region 407-1, 407-2, and 407-3, respectively, adjacent andcontacting their respective channels 403-1, 403-2, and 403-3. Tunnelregion 407-1 of first CT structure 401-1 can extend along pillar 403 ofsemiconductor material associated with string 411 and can extend throughthe other CT structures 401-2 and 401-3 as tunnel regions 407-2 and407-3 of each respective CT structure 401-2 and 401-3.

Each of tunnel regions 407-1, 407-2, and 407-3 can be implemented as aset of tunnel barriers. For example, each of tunnel regions 407-1,407-2, and 407-3 can be implemented as a three region tunnel barrier.Such a three region tunnel barrier can be implemented as a region ofdielectric oxide followed by a region of dielectric nitride followed byanother region of dielectric oxide. Each of tunnel regions 407-1, 407-2,and 407-3 may be implemented as a two region tunnel barrier. Each oftunnel regions 407-1, 407-2, and 407-3 may be implemented as a oneregion tunnel harrier. Further, each of tunnel regions 407-1, 407-2, and407-3 may have four or more regions, where the selection of material andthicknesses of these tunnel regions depends on the capability of thematerial with the given thicknesses to perform as a tunneling region.

Each of CT structures 401-1, 401-2, and 401-3 includes a charge trapregion 405-1, 405-2, and 405-3, respectively, adjacent and contactingtheir respective tunnel regions 407-1, 407-2, and 407-3. Each of chargetrap regions 405-1, 405-2, and 405-3 can be a dielectric material thatcan store charge from channels 403-1, 403-2, and 403-3, respectively.Charge trap regions 405-1, 405-2, and 405-3 can be realized as adielectric nitride region such as a region including dielectric siliconnitride. Other dielectric materials for charge trap regions 405-1,405-2, and 405-3 can be used to trap charge. Each of CT structures401-1, 401-2, and 401-3 includes a dielectric blocking region 409-1,409-2, and 409-3, respectively, adjacent and contacting their respectivecharge trap region 405-1, 405-2, and 405-3.

Each of CT structures 401-1, 401-2, and 401-3 includes a dielectricbarrier 410-1, 410-2, and 410-3 and a gate 415-1, 415-2, and 415-3,respectively, where each dielectric barrier 410-1, 410-2, and 410-3 isdisposed between dielectric blocking region 409-1, 409-2, and 409-3 andgates 415-1, 415-2, and 415-3 of their respective CT structures 401-1,401-2, and 401-3. Each of dielectric barriers 410-1, 410-2, and 410-3can be implemented using materials for the dielectric barriers selectedto enable processing of voids between CT structures 401-1, 401-2, and401-3 arranged in the 3D stack 406 associated with string 411. 3D stack406 can be realized as a 3D NAND stack 406. Each of dielectric barriers410-1, 410-2, and 410-3 can include an aluminum oxide or a dielectrichaving a dielectric constant greater than that of aluminum oxide. Eachof dielectric barriers 410-1, 410-2, and 410-3 can include one or moreof hafnium oxide, zirconium oxide, or mixtures of hafnium oxide and/orzirconium oxide with one or more of aluminum oxide, silicon oxide,titanium oxide, gadolinium oxide, niobium oxide, or tantalum oxide.Other high-κ dielectrics can be used for each of dielectric barriers410-1, 410-2, and 410-3.

CT structures 401-3, 401-2, and 401-1 can be separated from adjacent CTstructures by voids 420-3, 420-2, and 420-1, respectively. The chargetrap region and the dielectric blocking region of a CT structure can beseparated from the charge trap region and the dielectric blocking regionof an adjacent CT structure in a vertical stack by an associated void.The dielectric barrier of each CT structure can be arranged with thecharge trap region and the dielectric blocking region of the respectiveCT structure such that the charge trap region of the respective CTstructure is recessed vertically with respect to the dielectric blockingregion in the void. The dielectric blocking region of the respective CTstructure may be recessed in the void vertically with respect to thedielectric barrier and/or the gate of the of the respective CTstructure.

Void 420-3 is between CT structures 401-3 and 401-2. Void 420-3 caninclude one or more of dielectric barrier 410-3, dielectric blockingregion 409-3, or charge trap region 405-3 of CT structure 401-3 and oneor more of dielectric harrier 410-2, dielectric blocking region 409-2,or charge trap region 405-2 of CT structure 401-2 as boundaries of void420-3. Material of tunnel region 420-3 of CT structure 401-3 extends totunnel region 420-2 of CT structure 401-2 and provides a verticalboundary for void 420-3. In various embodiments, one or both ofdielectric harriers 410-3 and 410-2 of CT structures 401-3 and 401-2,respectively, may terminate near edges of their respective gates 415-3and 415-2 such that CT structures 401-3 and 401-2 do not include finstructures of dielectric barriers 410-3 and 410-2 shown in FIG. 4. (Seediscussion of fin structures with respect to CT structure 101 of FIGS.1A and 1B.) Charge trap region 405-3 of CT structure 401-3 can beseparated from charge trap region 405-2 of adjacent CT structure 401-2in the vertical stack 406 by void 420-3. Charge trap region 405-3 anddielectric blocking region 409-3 of CT structure 401-3 can be separatedfrom charge trap region 405-2 and dielectric blocking region 409-2 ofadjacent CT structure 401-2 in the vertical stack 406 by void 420-3.Dielectric barrier 410-3 of CT structure 401-3 can be arranged withcharge trap region 405-3 and dielectric blocking region 409-3, wherecharge trap region 405-3 is recessed vertically with respect todielectric blocking region 409-3 in void 420-3. Dielectric blockingregion 409-3 may be recessed in void 420-3 vertically with respect todielectric barrier 410-3 and/or gate 415-3. Dielectric barrier 410-2 ofCT structure 401-2 can be arranged with charge trap region 405-2 anddielectric blocking region 409-2, where charge trap region 405-2 isrecessed vertically with respect to dielectric blocking region 409-2 invoid 420-3. Dielectric blocking region 409-2 may be recessed in void420-3 vertically with respect to dielectric barrier 410-2 and/or gate415-2.

Void 420-2 is between CT structures 401-2 and 401-1. Void 420-2 caninclude one or more of dielectric barrier 410-2, dielectric blockingregion 409-2, or charge trap region 405-2 of CT structure 401-2 and oneor more of dielectric barrier 410-2, dielectric blocking region 409-2,or charge trap region 405-2 of CT structure 401-2 as boundaries of void420-2. Material of tunnel region 420-2 of CT structure 401-2 extends totunnel region 420-1 of CT structure 401-1 and provides a verticalboundary for void 420-2. In various embodiments, one or both ofdielectric barriers 410-2 and 410-1 of CT structures 401-2 and 401-1,respectively, may terminate near edges of their respective gates 415-2and 415-1 such that CT structures 401-2 and 401-1 do not include finstructures of dielectric barriers 410-2 and 410-1 shown in FIG. 4. (Seediscussion of fin structures with respect to CT structure 101 of FIGS.1A and 1B.) Charge trap region 405-2 of CT structure 401-2 can beseparated from charge trap region 405-1 of adjacent CT structure 401-1in the vertical stack 406 by void 420-2. Charge trap region 405-2 anddielectric blocking region 409-2 of CT structure 401-2 can be separatedfrom charge trap region 405-1 and dielectric blocking region 409-1 ofadjacent CT structure 401-1 in the vertical stack 406 by void 420-2.Dielectric barrier 410-2 of CT structure 401-2 can be arranged withcharge trap region 405-2 and dielectric blocking region 409-2 such thatcharge trap region 405-2 is recessed vertically with respect todielectric blocking region 409-2 in void 420-2. Dielectric blockingregion 409-2 may be recessed in void 420-2 vertically with respect todielectric barrier 410-2 and/or gate 415-2. Dielectric barrier 410-1 ofCT structure 401-1 can be arranged with charge trap region 405-1 anddielectric blocking region 409-1 such that charge trap region 405-1 isrecessed vertically with respect to dielectric blocking region 409-1 invoid 420-2. Dielectric blocking region 409-1 may be recessed in void420-2 vertically with respect to dielectric barrier 410-1 and/or gate415-1.

Void 420-1 is between CT structure 401-1 and a surface on which stack406 is disposed. Void 420-1 can include one or more of dielectricbarrier 410-1, dielectric blocking region 409-1, or charge trap region405-1 of CT structure 401-1 and the surface on which stack 406 isdisposed as boundaries of void 420-1. Material of tunnel region 420-1 ofCT structure 401-1 can extend to the surface on which stack 406 isdisposed and can provide a vertical boundary for void 420-1. In variousembodiments, one of both of dielectric barrier 410-1 CT structure 401-1may terminate near edges of gate 415-1 such that CT structure 401-1 doesnot include fin structures of dielectric barrier 410-1 shown in FIG. 4.(See discussion of fin structures with respect to CT structure 101 ofFIGS. 1A and 1B.) Charge trap region 405-1 of CT structure 401-1 can beseparated from the surface on which stack 406 is disposed by void 420-1.Charge trap region 405-1 and dielectric blocking region 409-1 of CTstructure 401-1 can be separated from the surface on which stack 406 isdisposed by void 420-1. Dielectric barrier 410-1 of CT structure 401-1can be arranged with charge trap region 405-1 and dielectric blockingregion 409-1 such that charge trap region 405-1 is recessed verticallywith respect to dielectric blocking region 409-1 in void 420-1.Dielectric blocking region 409-1 may be recessed in void 420-1vertically with respect to dielectric barrier 410-1 and/or gate 415-1.

Each of voids 420-1, 420-2, and 420-3 can be sealed by a dielectricregion 422-1, 422-2, and 422-3, respectively. Dielectric regions 422-1,422-2, and 422-3 can be part of the boundaries of voids 420-1, 420-2,and 420-3, respectively. Dielectric region 422-1 can be located on thesurface on which stack 406 is disposed, which may be conductive region413, and can extend to and can be located on a portion of gate 415-1 ofCT structure 401-1. Dielectric region 422-2 can be located on a portionof gate 415-2 of CT structure 401-2 and can extend to and be located ona portion of gate 415-1 of CT structure 401-1. Dielectric region 422-3can be located on a portion of gate 415-3 of CT 401-3 and can extend toand be located on a portion of gate 415-2 of CT structure 401-2. Invarious embodiments, one or more of dielectric regions 422-1, 422-2, and422-3 may terminate along and between the gates of adjacent CTstructures, where, in such cases, effectively two voids may be arranged.Each of voids 420-1, 420-2, and 420-3 are one of the voids associatedwith such a termination and the other effective void associated witheach of dielectric regions 422-3, 422-2, and 422-1 is a void betweengates of adjacent CT structures 401-3, 401-2, 401-1, and the surface onwhich stack 406 is disposed, respectively. Such sealing dielectricregions 422-1, 422-2, and 422-3 can be realized similar to sealingdielectric regions discussed with respect to FIGS. 1A and 1B.

Pillar 403 of string 411 of memory device 400 can be structured as adoped semiconductor hollow channel. By hollow channel is meant that theregion in the center of the 3-D channel can be filled by a materialdifferent than the material of the channel. Pillar 403 can include polysilicon as a hollow channel surrounding a dielectric 404. The regions ofstructure 400 shown in FIG. 4 can be arranged as rings of materialaround center region 404. Pillar 403 can operatively conduct a currentbetween conductive region 413 and a conductive data line coupled topillar 403. Such conductive data line may be coupled to pillar 403 by anaccess transistor. In various 3D memory architectures, such arrangementof conductive region 413 and a conductive data line coupled to pillar403 can be provided with conductive region 413 being a source region andconductive data line being a data line. The current can be affected bythe charge stored in CT structures 401-1, 401-2, and 401-3 along string411, where control of storing the charge is by the gates 415-1, 415-2,and 415-3 of CT structures 401-1, 401-2, and 401-3. Gates 415-1, 415-2,and 415-3 can be incorporated in access lines of a memory array ofmemory device 400. The access lines may be word lines.

Voids 420-1, 420-2, and 430-3 provide a mechanism to address couplingbetween charge trap regions and access line-to-access line RC (productof resistance and capacitance) issues associated with conventionalmemory arrays. Voids 420-1, 420-2, and 430-3 and the separation ofcharge trap regions 405-1, 405-2, and 405-3, as discussed with respectto FIG. 4, provide isolation to limit such coupling and RC issues. Thevoid arrangements between CT structures 401-1, 401-2, and 401-3 allowfor tier pitch scaling of a 3D memory structure, such as 3D NAND, toaround 30 nm from current values of 65 to 60 nm. Structural designs, andassociated processing, similar to memory device 400 enable less tierdeposition of tool capacity for vertical scaling of a 3D NAND usingreplacement gate processing. The separation of charge trap regionsbetween adjacent CT structures of a memory similar to memory device 400avoids or minimizes trapped charge hopping that occurs between adjacentCT structures for small gate-to-gate spacing with continuous charge trapregions between adjacent CT structures. The voids may allow for avoidingor minimizing coupling between charge trap regions. The reduced couplingand charge hopping enables the design of memory device 400 and similarmemories to have thinner stacks of memory cells. Formation of thesevoids can provide for access line (gate) capacitance to be held incheck, that is, controlled and, in conduction with limiting thedielectric barriers to vertical deployments with respect to theirassociated gates, can also allow for reduction in access line (gate)resistance.

FIG. 5 is a cross-sectional representation of an embodiment of a numberof CT structures, for example CT structures 501-1, 501-2, and 501-3, ina vertical string 511 of a memory device 500. Vertical string 511 can beone of multiple strings of a memory array of a 3D memory. An example ofa 3D memory device with multiple vertical strings is shown in FIG. 3.Other 3D memory devices with multiple vertical strings can be structuredwith CT memory cells, similar to CT structures 201 of FIG. 2A or 2B.Other vertical strings in a 3D memory device can be structured similarto vertical string 511, arranged with different sets of electricalconnections.

Vertical string 511 includes a pillar 503 of semiconductor materialcoupled to and part of CT structures 501-1, 501-2, and 501-3. Memorydevice 500 is not limited to three CT structures in a vertical string.FIG. 5 shows three CT structures to focus on the architecture of CTstructures arranged in a vertical stack 506 along or as part of verticalstring 511. Vertical string 511 can be include more than three CTstructures, for example, 8, 16, 32, 64, or other number of CT structurescoupled to pillar 503 of vertical string 511 depending on the memorysize of memory device 500 or other factors for an architecture formemory device 500. Each CT structure can be arranged as a memory cell ofa string, where each CT structure is at a different vertical level thanthe other CT structures of the string, which each vertical level is atier of the memory array of the memory device.

Stack 506 can be supported by a base 516. In FIG. 5, a space is shownbetween the bottom of stack 506 and base 516 to indicate that there maybe additional materials and/or integrated circuit structures betweenbase 516 and stack 506. In various applications, such additionalintegrated materials may include, for example, a source-side selecttransistor material. Base 516 may include a conductive region 513 on asubstrate 502. Depending on the architecture of memory device 500,conductive region 513 may be a source region. Conductive region 513 mayinclude semiconductor material. The semiconductor material may include,but is not limited to, monocrystalline silicon or polycrystallinesilicon. Substrate 502 may be a semiconductor substrate or a substratehaving a combination of semiconductor material and insulating material.

CT structure 501-1 is arranged as a first charge trap structure alongvertical string 511, above which charge trap structures 501-2 and 501-3are arranged in vertical stack 506 with each of charge trap structures501-2 and 501-3 disposed above another CT structure of vertical stack506. The semiconductor material of pillar 503 is arranged as a channel503-1, 503-2, and 503-3 for CT structures 501-1, 501-2, and 501-3,respectively, such that pillar 503 extends between and through CTstructures 501-1, 501-2, and 501-3. Each of CT structures 501-1, 501-2,and 501-3 includes a tunnel region 507-1, 507-2, and 507-3,respectively, adjacent and contacting their respective channels 503-1,503-2, and 503-3.

Each of tunnel regions 507-1, 507-2, and 507-3 can be implemented as aset of barriers. For example, each of tunnel regions 507-1, 507-2, and507-3 can be implemented as a three region tunnel barrier. Such a threeregion tunnel barrier can be implemented as a region of dielectric oxidefollowed by a region of dielectric nitride followed by another region ofdielectric oxide. Each of tunnel regions 507-1, 507-2, and 507-3 may beimplemented as a two region tunnel barrier. Each of tunnel regions507-1, 507-2, and 507-3 may be implemented as a one region tunnelbarrier. Further, each of tunnel regions 507-1, 507-2, and 507-3 mayhave four or more regions, where the selection of material andthicknesses of these tunnel regions depends on the capability of thematerial with the given thicknesses to perform as a tunneling region.

Each of CT structures 501-1, 501-2, and 501-3 includes a charge trapregion 505-1, 505-2, and 505-3, respectively, adjacent and contactingtheir respective tunnel regions 507-1, 507-2, and 507-3. Each of chargetrap regions 505-1, 505-2, and 505-3 can be a dielectric material thatcan store charge from channels 503-1, 503-2, and 503-3, respectively.Charge trap regions 505-1, 505-2, and 505-3 can be realized as adielectric nitride region such as a region including dielectric siliconnitride. Other dielectric materials for charge trap regions 505-1,505-2, and 505-3 can be used to trap charge. Each of CT structures501-1, 501-2, and 501-3 includes a dielectric blocking region 509-1,509-2, and 509-3, respectively, adjacent and contacting their respectivecharge trap region 505-1, 505-2, and 505-3.

Each of CT structures 501-1, 501-2, and 501-3 includes a dielectricharrier 510-1, 510-2, and 510-3 and a gate 515-1, 515-2, and 515-3,respectively, where each dielectric barrier 510-1, 510-2, and 510-3 isdisposed between dielectric blocking region 509-1, 509-2, and 509-3 andgates 515-1, 515-2, and 515-3 of their respective CT structures 501-1,501-2, and 501-3. Each of dielectric barriers 510-1, 510-2, and 510-3can be implemented using materials for the dielectric barriers selectedto enable processing of voids between CT structures 501-1, 501-2, and501-3 arranged in the 3D stack 506 associated with string 511. 3D stack506 can be realized as a 3D NAND stack 506. Each of dielectric barriers510-1, 510-2, and 510-3 can include an aluminum oxide or a dielectrichaving a dielectric constant greater than that of aluminum oxide. Eachof dielectric barriers 510-1, 510-2, and 510-3 can include one or moreof hafnium oxide, zirconium oxide, or mixtures of hafnium oxide and/orzirconium oxide with one or more of aluminum oxide, silicon oxide,titanium oxide, gadolinium oxide, niobium oxide, or tantalum oxide.Other high-κ dielectrics can be used for each of dielectric barriers510-1, 510-2, and 510-3.

CT structures 501-3, 501-2, and 501-1 can be separated from adjacent CTstructures by voids 520-3, 520-2, and 520-1, respectively. The tunnelregion of a CT structure can be separated from the tunnel region of anadjacent CT structure in a vertical stack by an associated void. Inaddition, the charge trap region and the dielectric blocking region ofthe respective CT structure may be separated from the charge trap regionand the dielectric blocking region of the adjacent CT structure in avertical stack by the associated void.

Void 520-3 is between CT structures 501-3 and 501-2. Void 520-3 caninclude one or more of dielectric barrier 510-3, dielectric blockingregion 509-3, charge trap region 505-3, or tunnel region 507-3 of CTstructure 501-3 and one or more of dielectric barrier 510-2, dielectricblocking region 509-2, charge trap region 505-2, or tunnel region 507-2of CT structure 501-2 as boundaries of void 520-3. Material of channel520-3 of CT structure 501-3 extends to channel 520-2 of CT structure501-2 and provides a vertical boundary for void 520-3. In variousembodiments, one of both of dielectric barriers 510-3 and 510-2 of CTstructures 501-3 and 501-2, respectively, may terminate near edges oftheir respective gates 515-3 and 515-2 such that CT structures 501-3 and501-2 do not include fin structures of dielectric barriers 510-3 and510-2 shown in FIG. 5. (See discussion of fin structures with respect toCT structure 201 of FIGS. 2A and 2B.) Tunnel region 507-3 of CTstructure 501-3 can be separated from tunnel region 507-2 of adjacent CTstructure 501-2 in the vertical stack 506 by void 520-3. Charge trapregion 505-3 and dielectric blocking region 509-3 of CT structure 501-3can be separated. from charge trap region 505-2 and dielectric blockingregion 509-2 of adjacent CT structure 501-2 in the vertical stack 506 byvoid 520-3. In variations of the structure of memory device 500illustrated in FIG. 5, dielectric barrier 510-3 of CT structure 501-3may be arranged with charge trap region 505-3 and dielectric blockingregion 509-3 such that charge trap region 505-3 is recessed verticallywith respect to dielectric blocking region 509-3 in void 520-3. Inaddition, dielectric blocking region 509-3 may be recessed in void 520-3vertically with respect to dielectric barrier 510-3 and/or gate 515-3.Such variations may include dielectric barrier 510-2 of CT structure501-2 arranged with charge trap region 505-2 and dielectric blockingregion 509-2 such that charge trap region 505-2 is recessed verticallywith respect to dielectric blocking region 509-2 in void 520-3. Inaddition, dielectric blocking region 509-2 may be recessed in void 520-3vertically with respect to dielectric barrier 510-2 and/or gate 515-2.

Void 520-2 is between CT structures 501-2 and 501-1. Void 520-2 caninclude one or more of dielectric barrier 510-2, dielectric blockingregion 509-2, charge trap region 505-2, or tunnel region 507-2 of CTstructure 501-2 and one or more of dielectric barrier 510-1, dielectricblocking region 509-1, charge trap region 505-1, or tunnel region 507-1of CT structure 501-1 as boundaries of void 520-2. Material of channel520-2 of CT structure 501-2 extends to channel 520-1 of CT structure501-1 and provides a vertical boundary for void 520-2. In variousembodiments, one of both of dielectric barriers 510-2 and 510-1 of CTstructures 501-2 and 501-1, respectively, may terminate near edges oftheir respective gates 515-1 and 515-1 such that CT structures 501-2 and501-1 do not include fin structures of dielectric barriers 510-2 and510-1 shown in FIG. 5. (See discussion of fin structures with respect toCT structure 201 of FIGS. 2A and 2B.) Tunnel region 507-2 of CTstructure 501-2 can be separated from tunnel region 507-2 of adjacent CTstructure 501-2 in the vertical stack 506 by void 520-2. Charge trapregion 505-2 and dielectric blocking region 509-2 of CT structure 501-2can be separated from charge trap region 505-1 and dielectric blockingregion 509-1 of adjacent CT structure 501-1 in vertical stack 506 byvoid 520-2. In variations of the structure of memory device 500illustrated in FIG. 5, dielectric barrier 510-2 of CT structure 501-2may be arranged with charge trap region 505-2 and dielectric blockingregion 509-2 such that charge trap region 505-2 is recessed verticallywith respect to dielectric blocking region 509-2 in void 520-2. Inaddition, dielectric blocking region 509-2 may be recessed in void 520-2vertically with respect to dielectric barrier 510-2 and/or gate 515-2.Such variations may include dielectric barrier 510-1 of CT structure501-1 arranged with charge trap region 505-1 and dielectric blockingregion 509-1 such that charge trap region 505-1 is recessed verticallywith respect to dielectric blocking region 509-1 in void 520-2. Inaddition, dielectric blocking region 509-1 may be recessed in void 520-2vertically with respect to dielectric barrier 510-1 and/or gate 515-1.

Void 520-1 is between CT structure 501-1 and a surface on which stack506 is disposed. Void 520-1 can include one or more of dielectricbarrier 510-1, dielectric blocking region 509-1, charge trap region505-1, or tunnel region 507-1 of CT structure 501-1 and the surface onwhich stack 506 is disposed as boundaries of void 520-1. Material ofchannel 520-1 of CT structure 501-1 extends to surface on which stack506 is disposed and provides a vertical boundary for void 520-1. Invarious embodiments, dielectric barrier 510-1 of CT structure 501-1 mayterminate near edges of its respective gate 515-1 such that CT structure501-1 does not include a fin structure of dielectric barrier 510-1 shownin FIG. 5. (See discussion of fin structures with respect to CTstructure 201 of FIGS. 2A and 2B.) Tunnel region 507-1 of CT structure501-1 can be separated from the surface on which stack 506 is disposedby void 520-1. Charge trap region 505-1 and dielectric blocking region509-1 of CT structure 501-1 can be separated from the surface on whichstack 506 is disposed by void 520-1. In variations of the structure ofmemory device 500 illustrated in FIG. 5, dielectric barrier 510-1 of CTstructure 501-1 may be arranged with charge trap region 505-1 anddielectric blocking region 509-1 such that charge trap region 505-1 isrecessed vertically with respect to dielectric blocking region 509-1 invoid 520-1. In addition, dielectric blocking region 509-1 may berecessed in void 520-1 vertically with respect to dielectric barrier510-1 and/or gate 515-1.

Each of voids 520-1, 520-2, and 520-3 can be sealed by a dielectricregion 522-1, 522-2, and 522-3, respectively. Dielectric regions 522-1,522-2, and 522-3 can be part of the boundaries of voids 520-1, 520-2,and 520-3, respectively. Dielectric region 522-1 can be located on thesurface on which stack 506 is disposed, which may be conductive region513, and can extend to and can be located on a portion of gate 515-1 ofCT structure 501-1. Dielectric region 522-2 can be located on a portionof gate 515-2 of CT structure 501-2 and can extend to and be located ona portion of gate 515-1 of CT structure 501-1. Dielectric region 522-3can be located on a portion of gate 515-3 of CT 501-3 and can extends toand be located on a portion of gate 515-2 of CT structure 501-2. Invarious embodiments, one or more of dielectric regions 522-1, 522-2, or522-3 may terminate along and between the gates of adjacent CTstructures, where, in such cases, effectively two voids may be arranged.Each of voids 520-1, 520-2, and 520-3 are one of the voids associatedwith such a termination and the other effective void associated witheach with dielectric region 522-3, 522-2, and 522-1 is a void betweengates of adjacent CT structures 501-3, 501-2, 501-1, and the surface onwhich stack 506 is disposed, respectively. Such sealing dielectricregions 522-1, 522-2, and 522-3 can be realized similar to sealingdielectric regions discussed with respect to FIGS. 2A and 2B.

Pillar 503 of string 511 of memory device 500 can be structured as adoped semiconductor hollow channel. Pillar 503 can include poly siliconas a hollow channel surrounding a dielectric 504. The regions ofstructure 500 shown in FIG. 5 can be arranged as rings of materialaround center region 504. Pillar 503 can operatively conduct a currentbetween conductive region 513 and a conductive data line coupled topillar 503. Such conductive data line may be coupled to pillar 503 by anaccess transistor. In various 3D memory architectures, such arrangementof conductive region 513 and a conductive data line coupled to pillar503 can be provided with conductive region 513 being a source region andconductive data line being a data line. The current can be affected bythe charge stored in CT structures 501-1, 501-2, and 501-3 along string511, where control of storing the charge is by the gates 515-1, 515-2,and 515-3 of CT structures 501-1, 501-2, and 501-3. Gates 515-1, 515-2,and 515-3 can be incorporated in access lines of a memory array ofmemory device 500. The access lines may be word lines.

The semiconductor material of pillar 503 arranged as a channel 503-1,503-2, and 503-3 for CT structures 501-1, 501-2, and 501-3,respectively, extends between and through CT structures 501-1, 501-2,and 501-3. Pillar 503 can include regions of alternating doping levels.For example, channels 503-1, 503-2, and 503-3 adjacent to and contactingtunnel regions 507-1, 507-2, and 507-3 can be doped different fromregions of pillar 503 adjacent to and forming a boundary of voids 520-1,520-2, and 520-3, respectively. Pillar 503 can include higher carrierdoping levels in regions 523-1, 523-2, and 523-3 of pillar 503 boundedby voids 520-1, 520-2, and 520-3, respectively, than in regions ofchannels 503-1, 503-2, and 503-3 hounded by and contacting tunnelregions 507-1, 507-2, and 507-3, respectively. The higher doping levelsin regions 523-1, 523-2, and 523-3 can be non-uniform along a verticallength of pillar 503 with respect to the carrier concentration inchannels 503-1, 503-2, and 503-3 bounded by tunnel regions 507-1, 507-2,and 507-3, respectively. The higher doping levels in regions 523-1,523-2, and 523-3 can be distributed as a gradient along a verticallength of pillar 503 with respect to the carrier concentration inchannels 503-1, 503-2, and 503-3 hounded by tunnel regions 507-1, 507-2,and 507-3, respectively. Such a gradient may be realized with an excessof majority carrier concentration, relative to doping along pillar 503bounded by tunnel regions 507-1, 507-2, and 507-3, approaching zero atthe beginning of the boundary of pillar 503 with tunnel regions 507-1,507-2, and 507-3. The higher doping levels in regions 523-1, 523-2, and523-3 can be distributed as gradient across pillar 503 in thex-direction, perpendicular to the length of pillar 503 along the CTstructures 503-1, 503-2, and 503-3. This dopant gradient can enhancecontrol of gate channels 515-1, 515-2, and 515-3 on channels 503-1,503-2, and 503-3, respectively. The higher carrier doping levels can ben-type doping. Alternatively, with semiconductor doping in the varioussections of CT structures 501-1, 501-2, and 501-3 being p-type, thehigher carrier doping levels can be p-type doping.

Voids 520-1, 520-2, and 530-3 provide a mechanism to address couplingbetween charge trap regions and access line-to-access line RC (productof resistance and capacitance) issues associated with conventionalmemory arrays. Voids 520-1, 520-2, and 530-3 and the separation ofcharge trap regions 505-1, 505-2, and 505-3, as discussed with respectto FIG. 5, provide isolation to limit such coupling and RC issues. Thevoid arrangements between CT structures 501-1, 501-2, and 501-3 allowfor tier pitch scaling of a 3D memory structure, such as 3D NAND, toaround 30 nm from current values of 65 to 60 nm. Structural designs, andassociated processing, similar to memory device 500 enable less tierdeposition of tool capacity for vertical scaling of a 3D NAND usingreplacement gate processing. The separation of charge trap regionsbetween adjacent CT structures of a memory similar to memory device 500avoids or minimizes trapped charge hopping that occurs between adjacentCT structures for small gate-to-gate spacing with continuous charge trapregions between adjacent CT structures. The voids may allow for avoidingor minimizing coupling between charge trap regions. Reduction ofcoupling between charge trap regions may also be provided by a dopantgradient between adjacent CT structures that is higher than dopinglevels in the channels adjacent tunnel regions of the adjacent CTstructures. Such doping gradients may enhance the control of individualgates, such as gates 515-1, 515-2, and 515-3 on the channels, such asrespective channels 503-1, 503-2, and 503-3 of their respective CTstructure, such as CT structures 501-1, 501-2, and 501-3. The reducedcoupling and charge hopping enables the design of memory device 500 andsimilar memories to have thinner stacks of memory cells. Formation ofthese voids can provide for access line (gate) capacitance to be held incheck, that is, controlled and, in conduction with limiting thedielectric barriers to vertical deployments with respect to theirassociated gates, can also allow for reduction in access line (gate)resistance.

FIG. 6 is a flow diagram of features of an embodiment of an examplemethod 600 of forming a charge trap structure. At 610, a dielectricbarrier is formed on a wall of an opening in a material stack. Formingthe dielectric barrier can include forming aluminum oxide or adielectric having a dielectric constant greater than that of aluminumoxide. Forming the dielectric barrier can include forming the dielectricbarrier with material that can withstand temperatures and etchingchemistries in processing the charge trap structure. Forming thedielectric barrier can include forming one or more of hafnium oxide,zirconium oxide, or mixtures of hafnium oxide and/or zirconium oxidewith one or more of aluminum oxide, silicon oxide, titanium oxide,gadolinium oxide, niobium oxide, or tantalum oxide. Other high-κdielectric materials may be used for the material for the dielectricbarriers.

At 620, a dielectric blocking region is formed adjacent to andcontacting the dielectric barrier. The material of the dielectricblocking region is different from the material of the dielectricbarrier. At 630, a charge trap region is formed adjacent to andcontacting the dielectric blocking region. Forming the charge trapregion can include forming a dielectric nitride as the charge trapregion. Other charge trapping material may be used. At 640, a tunnelregion is formed adjacent to and contacting the charge trap region. Thetunnel region may be formed as a set of regions that can provide fortransfer of charge carriers to the charge trap region. At 650, asemiconductor pillar is formed adjacent to and contacting the tunnelregion, the semiconductor pillar separated from the charge trap regionby the tunnel region. The semiconductor pillar is operable to conduct acurrent. Forming the semiconductor pillar can include forming polysilicon.

At 660, a gate is formed adjacent to and contacting the dielectricbarrier, the gate separated from the dielectric blocking region by thedielectric barrier. The gate is operable to control storage of charge inthe charge trap region. Forming the gate can include forming tungsten asthe gate. Forming the gate can include forming titanium nitride regionbetween the dielectric barrier and the tungsten.

At 670, the dielectric barrier is modified to allow for selectiveremoval of a portion of the dielectric blocking region and a portion ofthe charge trap region. At 680, the portion of the dielectric blockingregion and the portion of the charge trap region are removed such that avoid is formed between a remaining portion of the charge trap region anda region on which the charge trap structure is disposed.

Variations of method 600 or methods similar to method 600 can include anumber of different embodiments that may or may not be combineddepending on the application of such methods and/or the architecture ofsystems in which such methods are implemented. Such methods can includeforming the charge trap region recessed vertically with respect to thedielectric blocking region in the void. For example, the charge trapregion and the dielectric blocking region can be formed such that adistance between the charge trap region and the region on which thecharge trap structure is disposed is greater than a distance between thedielectric blocking region and the region on which the charge trapstructure is disposed. Forming the dielectric barrier can includeforming the dielectric barrier having a thickness in the range fromabout 15 angstroms to about 50 angstroms between the dielectric blockingregion and the gate in the completed charge trap structure. In variousembodiments, modifying the dielectric barrier can comprise: atomic layeretching (ALE or sometimes referred to as ALEt) the dielectric barrierselective to the gate and the dielectric blocking region; depositingadditional dielectric barrier material to form a modified dielectricbarrier; and atomic layer etching the modified dielectric barrier toform a mask on the dielectric blocking region. Method 600 or methodssimilar to method 600 can include forming a sealing dielectric informing the void.

ALE is similar to atomic layer deposition (ALD) except that ALD is adeposition process and ALE is a removal process. ALD is amonolayer-by-monolayer sequencing deposition process that allowsmaterial to be formed in a metered manner. ALE is a material removaltechnique based on sequential, self-limiting surface reactions. ALEprovides the capability to remove films with atomic layer control,allowing nanofabrication of a wide range of electronic devices. ALEremoval of Al₂O₃ has been reported using sequential, self limitingthermal reactions with tin(II) acetylacetonate (Sn(acac)₂) and HF asreactants in the cycles. Use of Sn(acac)₂ and HF to etch Al₂O₃ providinglinear removal of Al₂O₃ at temperatures from 150-250° C. at etch ratesof angstroms per cycle, dependent on the processing temperature, wasreported. ALE of HfO₂ has also been reported using Sn(acac)₂ and HF asthe reactants in sequential, self-limiting thermal reactions, wherelinear removal of the HfO₂ by the ALE process was achieved. Othermaterials, which may be etched by ALE, include other metal oxides, metalnitrides, metal phosphides, metal sulfides, and metal arsenides.

In various embodiments, methods including forming CT structure withassociated voids can be performed using variations of methods similar tomethod 600. Note that these features may be performed in a number ofdifferent sequencing steps and are not limited to the order or featuresas presented in FIG. 6.

In various embodiments, an apparatus can comprise a semiconductor pillaroperable to conduct a current; a charge trap region separated from thesemiconductor pillar by a tunnel region; a dielectric blocking regionadjacent to the charge trap region; a gate adjacent to the dielectricblocking region and operable to control storage of charge in the chargetrap region; and a dielectric barrier between and separating thedielectric blocking region and the gate, wherein the semiconductorpillar, the tunnel region, the charge trap region, the dielectricblocking region, the dielectric barrier, and the gate are part of acharge trap structure, and the charge trap region is separated by a voidfrom a region on which the charge trap structure is disposed. The chargetrap region can be recessed vertically with respect to the dielectricblocking region in the void. A distance between the charge trap regionand the region on which the charge trap structure is disposed can begreater than a distance between the dielectric blocking region and theregion on which the charge trap structure is disposed. The dielectricblocking region can be recessed in the void vertically with respect tothe dielectric barrier and/or the gate. The distance between thedielectric blocking region and the region on which the charge trapstructure is disposed can be greater than a distance between thedielectric barrier and the region on which the charge trap structure isdisposed.

The void, the dielectric blocking region, and the charge trap region canbe structured such that a ratio of vertical thickness of the charge trapregion to vertical thickness of the dielectric blocking region and sizeof the void are selected to attain a capacitance associated with thegate within a specified range. The dielectric barrier can includealuminum oxide or a dielectric having a dielectric constant greater thanthat of aluminum oxide. The dielectric barrier can have a thickness inthe range from about 15 angstroms to about 50 angstroms between thedielectric blocking region and the gate.

FIG. 7 is a flow diagram of features of an embodiment of an examplemethod 700 of forming multiple charge trap structures in a stack ofmaterial. At 710, a stack of material is formed with an openingsurrounded by material to form multiple charge trap structures of astring of memory cells. The multiple charge trap structures to be formedinclude a first charge trap structure with each charge trap structure ofthe string, except the first charge trap structure, disposed aboveanother one of the multiple charge trap structures. At 720, dielectricbarrier material within the stack of material is patterned by removingportions of the dielectric barrier material using atomic layer etchingfrom a backside of the stack of material after removing portions of thestack of material. Forming the stack of material can include forming thedielectric barrier material with aluminum oxide or a dielectric having adielectric constant greater than that of aluminum oxide. Forming thedielectric barrier material can include forming one or more of hafniumoxide, zirconium oxide, or mixtures of hafnium oxide and/or zirconiumoxide with one or more of aluminum oxide, silicon oxide, titanium oxide,gadolinium oxide, niobium oxide, or tantalum oxide. Other high-κdielectric materials may be used for the material for the dielectricbarriers.

At 730, portions of the patterned dielectric barrier material are usedas a mask to remove portions of material of the stack corresponding todielectric blocking regions and charge trap regions of the charge trapstructures such that a void is formed between the charge trap regions ofadjacent charge trap structures. The dielectric barrier materialseparates the dielectric blocking region from a gate in each completedcharge trap structure. The dielectric barrier material is different fromthe material for the dielectric blocking regions.

Variations of method 700 or methods similar to method 700 can include anumber of different embodiments that may or may not be combineddepending on the application of such methods and/or the architecture ofsystems in which such methods are implemented. Such methods can includeforming the charge trap region for each completed charge trap structurerecessed vertically with respect to the dielectric blocking region inthe void. Forming each charge trap structure of the multiple charge trapstructures can include forming each charge trap structure in a tier of amemory device such that tier pitch is about 30 nanometers. In anembodiment, portions of the formed stack of material can be used astunnel regions and channels of the multiple charge trap structures,where the tunnel regions of each charge trap structure are a portion ofmaterial in the stack from the first charge trap structure through allcharge trap structures and the channels are another portion of materialin the stack from the first charge trap structure through all chargetrap structures.

Method 700 or methods similar to method 700 can include forming asealing dielectric, between gates of adjacent charge trap structures informing the voids. Such methods can include patterning the dielectricbarrier material by repeating deposition and etching of additionaldielectric barrier material until openings in the dielectric barriermaterial attain a size to process the material corresponding todielectric blocking regions. The openings can be used to perform anoxide etch followed by a nitride etch to form the voids. After formingthe voids, a dielectric can be formed in open regions to seal the openregions, where the open regions were formed by the removing of portionsof the stack of material to pattern the dielectric barrier material.Forming the dielectric in the open regions can include forming thedielectric using plasma-enhanced chemical vapor deposition.

In various embodiments, methods including forming CT structure withassociated voids can be performed using variations of methods similar tomethod 700. Note that these features may be performed in a number ofdifferent sequencing steps and are not limited to the order or featuresas presented in FIG. 7.

In various embodiments, a memory device can comprise: a vertical stringof memory cells including a vertical pillar of semiconductor material;and multiple CT structures, including a first CT structure, arrangedalong the vertical string, the multiple CT structures arranged in avertical stack with each CT structure, except for the first CTstructure, disposed above another one of the multiple CT structures.Each CT structure can include: the semiconductor material operable as achannel for the CT structure; a tunnel region adjacent and contactingthe semiconductor material; a charge trap region adjacent and contactingthe tunnel region; a dielectric blocking region adjacent and contactingthe charge trap region, the charge trap region separated from the chargetrap region of an adjacent CT structure in the vertical stack by a void;and a dielectric barrier between and separating the dielectric blockingregion and a gate of the CT structure.

The dielectric barrier of each CT structure can be arranged with thecharge trap region and the dielectric blocking region of each CTstructure such that the charge trap region is recessed vertically withrespect to the dielectric blocking region in the void. For example, adistance between the charge trap region and the region on which thecharge trap structure is disposed can be greater than a distance betweenthe dielectric blocking region and the region on which the charge trapstructure is disposed. The dielectric blocking region can be recessed inthe void vertically with respect to the dielectric barrier and/or thegate. For example, the distance between the dielectric blocking regionand the region on which the charge trap structure is disposed can begreater than a distance between the dielectric barrier and/or the gateand the region on which the charge trap structure is disposed. Thetunnel region of the first CT structure can extend along the pillar ofsemiconductor material and can extend through the other CT structures asthe tunnel region of each CT structure. A sealing dielectric can bedisposed between gates of adjacent CT structures to seal the voidbetween adjacent charge trap regions of the string.

The dielectric barrier can include aluminum oxide or a dielectric havinga dielectric constant greater than that of aluminum oxide. The chargetrap region and the dielectric blocking region can be composed ofmaterials such that, in fabrication, the charge trap region is removablein part by an etchant material while the dielectric blocking region issubstantially unaffected by the etchant material. Each CT structure ofthe multiple CT structures can be arranged in a tier of the memorydevice such that tier pitch is about 30 nanometers.

FIG. 8 is a flow diagram of features of an embodiment of an examplemethod of forming multiple charge trap structures in a stack ofmaterial. At 810, a stack of material is formed with an openingsurrounded by material to form tunnel regions, charge trap regions,dielectric blocking regions, and dielectric barriers of multiple chargetrap structures of a string of memory cells. The multiple charge trapstructures being formed include a first charge trap structure with eachcharge trap structure of the string of memory cells, after the firstcharge trap structure, disposed above another one of the multiple chargetrap structures of the string.

At 820, multiple gates are formed contacting material for the dielectricbarriers and removal of material from the stack of material is conductedsuch that each gate is separated from a vertically adjacent gate of themultiple gates by an open area, exposing portions of the material forthe dielectric harriers. Forming multiple gates contacting material forthe dielectric barriers and removing material such that each gate isseparated from a vertically adjacent gate of the multiple gates caninclude removing sacrificial regions adjacent the material for thedielectric harriers using a chemistry and process to remove thesacrificial regions substantially without removing material for thedielectric barrier. Gate material can be formed in each region in whicha sacrificial region is removed. Material of an isolation dielectric canbe removed from between each gate by a chemistry and process to removethe isolation dielectric previously formed between adjacent sacrificialregions.

At 830, material for the dielectric barrier is processed in each openarea including applying atomic layer etching to the material for thedielectric barriers to form openings in the dielectric barriers exposingmaterial for the dielectric blocking regions to the previously openedareas between the gates. Processing material for the dielectric barriersin each open area including applying atomic layer etching to thematerial for the dielectric barriers can include applying a first atomiclayer etching to remove portions of the material for the dielectricbarrier using a chemistry selective to removing material for thedielectric barrier substantially without removing material of the gateor material for the dielectric blocking region. Additional material ofthe dielectric barrier can be deposited, after removing portions of thematerial for the dielectric barriers, on adjacent gates in each openarea and on surfaces of material for dielectric blocking regions exposedby the first atomic layer etching. Atomic layer etching can be appliedto the additional material for the dielectric barriers providing theopenings for the removing of portions of the dielectric blockingregions.

At 840, portions of the material for the dielectric blocking regions areremoved vertically using the openings in the dielectric barrier,exposing material for the charge trap region. At 850, portions of thematerial for the charge trap regions are removed vertically using theopenings in the dielectric barriers. At 860, after removing portions ofthe dielectric blocking regions and charge trap regions, the open areasbetween the gates are sealed to form voids between remaining portions ofthe charge trap regions of adjacent charge trap structures. Sealing thevoid can include forming a dielectric between the gates of the adjacentcharge trap structures. Forming the dielectric between the gates of theadjacent charge trap structures can include forming the dielectric froman entrance to the open areas and terminating the forming of thedielectric prior to reaching the material for the dielectric barrier,leaving a void between adjacent gates.

Variations of method 800 or methods similar to method 800 can include anumber of different embodiments that may or may not be combineddepending on the application of such methods and/or the architecture ofsystems in which such methods are implemented. Removing the portions ofthe material for the dielectric blocking regions and removing theportions of the material for the charge trap regions can includeremoving these portions such that the charge trap region of eachcompleted charge trap structure is recessed vertically with respect tothe dielectric blocking region in the void. For example, a distancebetween the charge trap region of each completed charge trap structureand the region on which the charge trap structure is disposed can begreater than a distance between the dielectric blocking region of eachrespective completed charge trap structure and the region on which thecharge trap structure is disposed. The dielectric barrier materialseparates the dielectric blocking region from a gate in each completedcharge trap structure. Removing portions of the material for thedielectric blocking regions vertically using the openings in thedielectric barrier can include conducting an etch to remove portions ofthe material for dielectric blocking regions. Removing portions of thematerial for the charge trap regions vertically using the openings inthe dielectric barriers can include conducting another etch to removeportions of the material for the charge trap regions to form therecessed charge trap region without substantially recessing material forthe gate. After forming the recessed charge trap regions, annealing thestack can be conducted.

Variations of method 800 or methods similar to method 800, in which thecharge trap region of each completed charge trap structure is recessedvertically with respect to the dielectric blocking region in the void,can include balancing a size of openings in the material dielectricbarrier used to remove the portions of the dielectric blocking regionwith a ratio of thickness of a completed charge trap region to thicknessof a completed dielectric blocking region to attain a desired gate stackdimension.

Variations of method 800 or methods similar to method 800 can includesealing the void associated with each charge trap structure to a regionbetween adjacent charge trap structures, where each void has boundariesincluding the charge trap region of each adjacent charge trap structurealong with material of the stack of material providing the tunnelregions of the adjacent charge trap structures.

Variations of method 800 or methods similar to method 800 can includeremoving portions of the tunnel region using the openings of thedielectric barriers, exposing a semiconductor pillar, in addition toremoving the portions of the material for the dielectric blockingregions and the portions of the material for the charge trap regions.Such methods can include applying a vapor to the exposed semiconductorpillar to generate doping to the semiconductor pillar increasing carrierdoping levels in a region of the semiconductor pillar between directlyadjacent charge trap structures. The increased carrier doping levels arerelative to the level doping in regions of the semiconductor pillarbounded by the tunnel region of the charge trap structures. Applying avapor can include applying phosphine to increase the carrier dopinglevels. Another vapor that can be used in an isotropic vapor anneal isarsine. Other chemical vapors that provide doping can be used. Chemicalssuch as phosphine and arsine provide n-type doping. For a p-typechannel, to increase carrier doping level, a vapor can be applied thatprovides increased p-type doping. Applying a vapor anneal with a p-typespecies can include applying diborane gas to provide an increase inp-type doping levels. For an undoped semiconductor pillar, to increasecarrier doping level in the regions of the semiconductor pillar boundedby the tunnel region of the charge trap structures, a vapor can beapplied that provides p-type doping or n-type doping. The selection ofthe doping type in the regions of the semiconductor pillar bounded bythe tunnel region of the charge trap structures can depend on otherfeatures of the integration scheme, for example, the doping scheme ofselector devices vertically coupled to the stack of CT structures.Various methods can include activating dopants in the regions of thesemiconductor pillar between adjacent charge trap structures withoutdiffusing dopants into the semiconductor pillar bounded by the tunnelregion of each charge trap structure.

In various embodiments, the charge trap regions can be nitride regions,the dielectric blocking regions can be oxide regions, and the materialfor the dielectric barriers can include aluminum oxide or a dielectrichaving a dielectric constant greater than that of aluminum oxide. Adielectric having a dielectric constant greater than that of aluminumoxide can include one or more of hafnium oxide, zirconium oxide, ormixtures of hafnium oxide and/or zirconium oxide with one or more ofaluminum oxide, silicon oxide, titanium oxide, gadolinium oxide, niobiumoxide, or tantalum oxide. Other high-κ dielectric materials may be usedfor the material for the dielectric barriers.

In various embodiments, an apparatus can comprise: a semiconductorpillar operable to conduct a current; a charge trap region separatedfrom the semiconductor pillar by a tunnel region; a dielectric blockingregion adjacent to the charge trap region; a gate adjacent to thedielectric blocking region and operable to control storage of charge inthe charge trap region; and a dielectric barrier between the dielectricblocking region and the gate, wherein the tunnel region and thesemiconductor pillar are arranged as boundaries of a void. Thedielectric barrier, the dielectric blocking region, and the charge trapregion can be arranged as boundaries of the void. The semiconductorpillar can include higher carrier doping levels in a region of thesemiconductor pillar bounded by the void than in regions of thesemiconductor pillar bounded by the tunnel region. The higher carrierdoping levels are n-type doping.

The apparatus can include a die having a charge trap structure, thesemiconductor pillar, the tunnel region, the charge trap region, thedielectric blocking region, the dielectric barrier, and the gatedisposed as part of the charge trap structure.

The CT structure can be one of a number of substantially identicallystructured CT structures arranged in a vertical stack such that thetunnel region of a CT structure is separated from the tunnel region ofan adjacent CT structure in the vertical stack by a void. The CTstructures can be arranged in the vertical stack with the semiconductorpillar being common such that regions of the semiconductor pillarbetween adjacent charge trap structures have higher carrier dopinglevels than regions of the semiconductor pillar adjacent and contactingthe tunnel regions of the charge trap structures. The dielectric barriercan include dielectric material different from material of thedielectric blocking region such that the dielectric material of thedielectric barrier is capable of withstanding material processing forformation of the gate and removal of portions of the charge trap regionand the dielectric blocking region to form the void.

In various embodiments, a memory device can comprise: a vertical stringof memory cells including a vertical pillar of semiconductor material;and multiple charge trap structures, including a first charge trapstructure, arranged along the vertical string, the multiple charge trapstructures arranged in a vertical stack with each charge trap structure,except for the first charge trap structure, disposed above another oneof the multiple charge trap structures. Each charge trap structure caninclude: the semiconductor material operable as a channel for the chargetrap structure; a tunnel region adjacent and contacting thesemiconductor material; a charge trap region adjacent and contacting thetunnel region; a dielectric blocking region adjacent and contacting thecharge trap region; a dielectric barrier between and separating thedielectric blocking region and a gate of the charge trap structure,wherein the tunnel region is separated from the tunnel region of anadjacent charge trap structure in the vertical stack by a void. Thevertical pillar of semiconductor material can include higher carrierdoping levels in a region between adjacent CT structures bounded by thevoid than in regions bounded by the tunnel region of each CT structure.The dielectric barrier can include aluminum oxide or one or more ofhafnium oxide, zirconium oxide, or mixtures of hafnium oxide and/orzirconium oxide with one or more of aluminum oxide, silicon oxide,titanium oxide, gadolinium oxide, niobium oxide, or tantalum oxide. Asealing dielectric can be disposed between gates of adjacent CTstructures providing a seal to the void between adjacent CT structures.

FIGS. 9A-9R are cross-sectional views illustrating features of stages ofan embodiment of forming multiple CT structures in an electronic device.FIG. 9A shows a material stack 921 above a conductive region 913 on asubstrate 902. Material stack 921 includes alternating isolationdielectrics 918 and sacrificial regions 919 above conductive region 913.The number of alternating isolation dielectrics 918 and sacrificialregions 919 may depend on the number of CT structures being formed in avertical stack. For a 3D memory device, this number can depend on thenumber of tiers in a memory array of the memory device, for example, apair of isolation dielectric 918 and sacrificial region 919 for eachtier. Three isolation dielectrics 918 and three sacrificial regions 919,which can correspond to three tiers in a memory array of a memorydevice, are shown in FIG. 9A for ease of discussion. Isolationdielectrics 918 can include, but are not limited to, an oxide such assilicon oxide, and sacrificial regions 919 can include but are notlimited to, a nitride such as silicon nitride. The choice of materialfor isolation dielectrics 918 and sacrificial regions 919 can depend onthe temperatures and chemistries used in fabricating multiple CTstructures. Conductive region 913 can be a semiconductor region 913.Semiconductor region 913 may be formed including poly silicon. In FIGS.9A-9R, a space is shown between conductive region 913 on substrate 902and the lowest isolation dielectric 918 of stack 921 vertically fromconductive region 913 to indicate that there may be additional materialsand/or integrated circuit structures between this isolation dielectric918 and conductive region 913.

FIG. 9B shows material stack 921 after a removal process has beenconducted to form trenches 914 in which pillars for strings of CTstructures are being formed. The removal process can include maskingareas and etching material stack 921 in the locations for the trenches914. Trenches 914 may be referred to as open pillars 914 in materialstack 921. Each open pillar 914 may become a separate individual stringof CT structures in a memory array of a memory device. Each open pillar914 may be cylindrical-like in shape or have some other similar shapethat extends vertically though material stack 921 (z-direction), butextends a relatively short distance in material stack 921 in they-direction. In FIG. 9B, open pillars 914 are arranged along conductiveregion 913 in the x-direction, where multiple CT structures will bestacked on each other in the z-direction in each open pillar 914. Thoughnot shown for ease of discussion, open pillars 914 can be formed in they-direction with multiple CT structures stacked on each other in thez-direction in each open pillar 914 in the y-direction. See, forexample, FIG. 2.

FIG. 9C shows one of the open pillars 914 associated with FIG. 9B. Thefigures following 9C show processing of this open pillar 914, where suchprocessing is being performed on the other similar open pillarsassociated with material stack 921 of FIG. 9B. FIG. 9D shows a materialfor a dielectric barrier 910 formed on a wall of open pillar 914 of FIG.9C. Forming the material for dielectric barrier 910 can includedepositing one or more of aluminum oxide, hafnium oxide, zirconiumoxide, or mixtures of hafnium oxide and/or zirconium oxide with one ormore of aluminum oxide, silicon oxide, titanium oxide, gadolinium oxide,niobium oxide, or tantalum oxide. Forming the material for dielectricbarrier 910 can include depositing other high-κ dielectrics. Thedeposition can be performed using one or more of a number of depositionprocesses. For example, the deposition can be implemented using chemicalvapor deposition (CVD), ALD, or other process suitable for forming a 3Dmemory device. These deposition techniques can be used in depositingmaterial at various stages of forming the multiple CTs associated withFIGS. 9A-9R. ALD allows formation of a region as a nanolaminate of anumber of different compounds in each of sub-region of the region withthe formed region having a total thickness in the nanometer region. Theterm “nanolaminate” means a composite film of ultra thin layers of twoor more materials in a layered stack. Typically, each layer in ananolaminate has a thickness of an order of magnitude in the nanometerrange. Further, each individual material layer of the nanolaminate mayhave a thickness as low as a monolayer of the material or as high as 5nanometers. The material for dielectric barrier 910 can be formed with athickness from the wall of the open pillar 914 in the range of 20 to 50angstroms.

FIG. 9E shows the structure of FIG. 9D after formation of material fordielectric blocking region 909 on a surface of the material fordielectric barrier 910 opposite the wall of the open pillar 914. Thematerial for dielectric blocking region 909 can include silicon oxide orother dielectric material. The material for dielectric blocking region909 can be selected to be different from the material for dielectricbarrier 910. FIG. 9F shows the structure of FIG. 9E after material for acharge trap region 905 is formed on a surface of the material fordielectric blocking region 909 opposite the surface of the material fordielectric barrier 910. The material for charge trap region 905 caninclude a dielectric nitride. For example, a dielectric nitride ofcharge trap region 905 can include silicon nitride. The material forcharge trap region 905 may include other dielectric material capable oftrapping charge.

FIG. 9G shows the structure of FIG. 9F after formation of material for atunnel region 907 on the material for charge trap region 905. Thematerial for tunnel region 907 can be implemented as a three regiontunnel barrier as shown in FIG. 9E. Such a three region tunnel barriercan be implemented as a region of dielectric oxide followed by a regionof dielectric nitride followed by another region of dielectric oxide.Alternatively, the material for tunnel region 907 may be implemented asa two region tunnel barrier. Also, the material for tunnel region 907may be implemented as a one region tunnel barrier. Further, the materialfor tunnel region 907 may have four or more than regions, where theselection of material and thicknesses depends on the capability of thematerial with the given thicknesses to perform as a tunneling region tocharge trap region 905. The material for tunnel region 907 can includeone or more dielectrics such as silicon oxide or a high-κ dielectric.

FIG. 9H shows the structure of FIG. 9G after formation of material for asemiconductor pillar 903 on the material for tunnel region 907. Thematerial for a semiconductor pillar 903 may be formed as a doped hollowchannel. The doped hollow channel can be coupled to conductive region913 via material and/or integrated circuit structures coupled on andcontacting conductive region 913. For example, the material forsemiconductor pillar 903 may be semiconductor material deposited toextend to and contact conductive region 913. Conductive region 913 canbe formed as a semiconductor region 913 having a majority carrierconcentration at a concentration level higher than the majority carrierconcentration of semiconductor pillar 903. Semiconductor region 913 canbe formed as a source region.

From the processed structure in FIG. 9H, procedures can be performed togenerate gates and voids for CT structures of a completed device. Theregions of the structure shown in FIG. 9H can be arranged as rings ofmaterial around the center region of open pillar 914. The center regionof open pillar 914 may be filled with a dielectric at some time in theprocess after forming the material for semiconductor pillar 903 on thematerial for tunnel region 907. On either side of the structure of openpillar 914 surrounded by materials for semiconductor pillar 903, tunnelregion 907, dielectric blocking region 909, and dielectric barrier 910along with portions of isolation dielectrics 918 and sacrificial regions919 shown in FIG. 9H, vertical slits can be created through the set ofisolation dielectrics 918 and sacrificial regions 919 to allowprocessing of isolation dielectrics 918 and sacrificial regions 919adjacent the material for dielectric barrier 910 to form the appropriategates and voids. For example, indicated in FIG. 9B, there are a numberof open pillars 914 being processed. Once the opened pillars have beenprocessed to include material for CT structures in pillars 914, regionsbetween pillars 914 of FIG. 9B can be removed, forming slits. Such slitsmay have been created earlier in the process. Theses slits provideaccess to the further process the structures of FIG. 9H, which caninclude providing processing chemical compounds to the desired areas ofpillar 914 and/or the immediate region around 914.

FIG. 9I shows the structure of FIG. 9H after removal of sacrificialregions 919, where after removal air can occupy the previous sacrificialregions 919. The removal of sacrificial regions 919 can include etchingthe material of sacrificial regions 919 that is selective to thematerial for isolation regions 918 and the material for dielectricbarrier 910. By selective with respect to etching is meant that theetchant that removes the sacrificial regions 919 does not remove thematerial for isolation regions 918 and the material for dielectricbarrier 910. With the material for sacrificial regions 919 being anitride such as silicon nitride, the material for isolation regions 918being an oxide such as silicon oxide, and the material for dielectricbarrier being a metal oxide such as AlO_(x), the nitride of sacrificialregions 919 may be removed using a hot phosphoric acid etchant.

FIG. 9J shows the structure of FIG. 9I after deposition of material forgates 915 in the regions that were previously sacrificial regions 919.This technique of depositing material for gates 915 is typicallyreferred to as a replacement gate deposition. The material for gates 915can include a metal. Such a metal can include, but is not limited to,tungsten. The material for gates 915 can include a compound of a metaland a non-metal, where the compound has metallic properties. Thematerial for gates 915 can include, but is not limited to, conductivetitanium nitride. The material for gates 915 can include combinations ofmaterials. For example, the material for gates 915 can include, but isnot limited to, conductive titanium nitride and tungsten. In somestructures, conductive titanium nitride of gates 915 may separate thematerial for isolation regions 918 and the material for dielectricbarrier 910 from tungsten of gates 915.

The deposition of the material for gates 915 can be made with materialat temperatures using deposition techniques that are selective to thematerial for isolation regions 918 and the material for dielectricbarrier 910. By selective deposition with respect to the material forisolation regions 918 and the material for dielectric barrier 910 ismeant that the selected material for deposition is deposited at thedesired location without substantial interaction with the material forisolation regions 918 and the material for dielectric barrier 910.Interaction at the interfaces with the material the material forisolation regions 918 and the material for dielectric barrier 910 mayoccur, but leaving the material for isolation regions 918 and thematerial for dielectric barrier 910 substantially as before thedeposition. For forming strings of memory cells in a memory device,forming the material for gates 915 can include isolating the materialfor gates 915 coupled to or integrated with access lines for the memoryarray. These access lines may be word lines.

FIG. 9K shows the structure of FIG. 9J after removal of the material forisolation regions 918 between the material for gates 915. The removal ofthe tiers of isolation regions 918 can be performed using a chemistryselected in conjunction with the selection of the material for gates 915and the material for dielectric barrier 910. A criterion used for theselection can include selecting a chemistry that is selective to thematerial for gates 915 and material for dielectric barrier 910 such thatthe chemistry does not substantially affect the material for gates 915and the material for dielectric barrier 910. The material for dielectricbarrier 910 acts as a mask that allows tiers of isolation regions 918 tobe removed without removing material for dielectric blocking region 909.Removal of tiers of isolation regions 918 may include use of hydrogenfluoride (HF), a vapor etch, or other chemistry that the material fordielectric barrier 910 can withstand so that the underlying material fordielectric blocking region 909 is not removed with the removal of tiersof isolation regions 918.

The material for dielectric barrier 910, such as AlO_(x) or other high-κmaterial are to be deposited to be able to resist both a hot phosphoricacid removal of sacrificial regions 919, such as a nitride removal, aswell as a HF or other chemistry used for removal of isolation regions918, such as an oxide tier removal. For AlO_(x), there are hightemperature ALD processes, as well as halide based ALD processes, thatmay be implemented for the deposition of AlO_(x) to withstand thesechemistries. Halide processes exist for deposition of HfO_(x) and otherhigh-κ materials that may be implemented such that these deposited filmsstand up to the hot phosphoric acid as well as the HF and other oxideetch chemistries. Other processes for forming HfO_(x) and/or otherhigh-κ materials for dielectric barrier 910, such that they surviveremoval processes, may include use of standard metal organic ALDprecursors. Other processes to condition the material for dielectricbarrier 910 to survive removal processes may include using varioustreatments after ALD deposition. These other processes may includeanneals (either in inert or reactive ambients), plasma treatments, etc.

FIG. 9L shows the structure of FIG. 9K after removal of portions of thematerial for dielectric barrier 910 in preparation for processing theother materials in pillar 914. The removal of portions of the materialfor dielectric barrier 910 can be conducted using ALE that is selectiveto the material for gate 915 and the material for dielectric blockingregion 909 such that the material for gate 915 and the material fordielectric blocking region 909 are not removed. The metered removalmechanism of ALE allows removal of the material for dielectric barrier910 from between the material for gates 915 without recessing too muchof the material for dielectric barrier 910 from between the material forgates 915 and the material for dielectric blocking region 909.

FIG. 9M shows the structure of FIG. 9K after formation of additionalmaterial for dielectric barrier 910 on the material for dielectricblocking region 909 and on the material for gate 915. The deposition ofthis additional material can include filling the region betweendielectric blocking region 909 and on the material for gate 915 and mayprovide a region with thin thickness on the material for gate 915. Forexample, the thickness of the additional material on the material forgate 915 may be, but in not limited to 2 nm.

FIG. 9N shows the structure of FIG. 9M after removal of portions of theadditional material for dielectric barrier 910. The removal may beperformed using ALE of the additional material for dielectric barrier910 selective to the material for gates 915 and the material fordielectric blocking region 909 such that the material for gate 915 andthe material for dielectric blocking region 909 are not removed. ALEallows control of fine etching due its capability to remove material ina metered manner with etch rates in of angstroms per applied cycle.Repeating deposition and etching of additional material for dielectricbarrier 910 can be performed for more masking of the material fordielectric blocking region 909.

FIG. 9O shows the structure of FIG. 9N after repetition of depositionand etching of additional material for dielectric barrier 910 to form anopening to provide a mask for processing the material for dielectricblocking region 909. The removal may be performed using ALE of theadditional material for dielectric barrier 910 selective to the materialfor gates 915 and the material for dielectric blocking region 909 suchthat the material for gate 915 and the material for dielectric blockingregion 909 are not removed. Continued repeating of the deposition andetching of additional material for dielectric barrier 910 can beperformed until the opening in the material for dielectric blockingregion 909 meets the desired size for the mask to process the materialfor dielectric blocking region 909. The resulting material fordielectric barrier 910 with its opening can be used as a criticaldimension reduction mask to subsequently etch out the material fordielectric blocking region 909 and the material for the charge trapregion 905. In an embodiment, multiple deposition/etch cycles ofadditional material for dielectric barrier 910 may be reduced in numberby using an appropriate thickness ratio of the material for the chargetrap region 905 to the material for dielectric blocking region 909during the formation of the material for dielectric blocking region 909and the material for the charge trap region 905 in open pillar 914,associated with FIGS. 9E and 9F. The desired size of the opening in thematerial for dielectric barrier 910, which is the basis for multipledeposition/etch cycles of additional material for dielectric barrier910, can be related to the relationship of the structures for thedielectric blocking region 909 and the charge trap region 905 in thecompleted CT structures. The thickness ratio of the material for thecharge trap region 905 to the material for dielectric blocking region909 may be made sufficiently high to allow control the size of a voidbetween charge trap regions 905 in adjacent completed CT structures.

FIG. 9P shows the structure of FIG. 9O after removal of portions of thematerial for dielectric blocking region 909. The removal may beperformed selective to the material for gates 915 and the material fordielectric barrier 910 such that the material for gate 915 and thematerial for dielectric barrier 910 are not removed. In addition, theremoval of the portions of the material for dielectric blocking region909 can be performed with removing the material for the charge trapregion 905, which may be accomplished with the choice of removingmaterial and processing parameters such as length of time for removal.With the material for dielectric blocking region 909 including an oxide,the removal of the portions of the material for dielectric blockingregion 909 can include an oxide etch.

FIG. 9Q shows the structure of FIG. 9P after removal of portions of thematerial for charge trap region 905. The removal may be performedselective to the material for gates 915, the material for dielectricbarrier 910, and the material for dielectric blocking region 909 suchthat the material for gates 915, the material for dielectric barrier910, and the material for dielectric blocking region 909 are notremoved. With the material for charge trap region 905 including anitride, the removal of the portions of the material for charge trapregion 905 can include a nitride etch. With the material for dielectricblocking region 909 being an oxide and the material for charge trapregion 905 including a nitride, an oxide etch can be performed followedby a nitride etch, a wet etch or a vapor etch, to remove portions of thedielectric blocking region 909 and portions of the charge trap region905 without recessing the material for gates 915.

The removal of the portions of the material for charge trap region 905may be conducted such that the material for charge trap region 905 isrecessed vertically from the material for dielectric blocking region909. In addition, the material for dielectric blocking region 909 mayhave been processed such that the material for dielectric blockingregion 909 is recessed vertically from the material for dielectricblocking region 909 and/or the material for gates 915. Controlling thethickness ratio of the material for the charge trap region 905 to thematerial for dielectric blocking region 909 in the formation phase ofthese regions in open pillar 914 can compensate for small criticaldimensions under the material for gates 915 in the area toward thematerial for tunnel region 907. Balancing isotropic etch profiles of thematerial for dielectric blocking region 909 and the material for thecharge trap region 905 with the formation of the mask from patterningthe material for dielectric barrier 910 and the thickness ratio of thematerial for the charge trap region 905 to the material for dielectricblocking region 909 can provide an optimal gate and CT stack dimensions,allowing for a 30 nm tier pitch in a memory array of a memory device inwhich the CT stack is formed. In addition, an anneal or other treatmentmay be performed to prevent etch damage along the CT edges in the stackfrom removal of the material for dielectric blocking region 909 and thematerial for the charge trap region 905.

FIG. 9R shows the structure of FIG. 9Q after formation of dielectrics922 to seal voids 920. Formation of dielectrics 922 can be conductedselective to the material for gates 915, the material for dielectricbarrier 910, and the material for dielectric blocking region 909 suchthat dielectric 922 does not interact to change the material for gates915, the material for dielectric barrier 910, and the material fordielectric blocking region 909. Dielectrics 922 can be formed in a“pinch off” sealing process to seal voids 920. The sealing process canbe implemented using plasma-enhanced chemical vapor deposition (PECVD)or other depleting process. In forming a seal, using PECVD or otherdeposition process that is not completely conformal can provide a void.In such cases, the sealing films are typically deposited at subatmospheric pressures of a few mTorr to a few Torr. This pressureremains inside the void after it is sealed up. This void may be referredto as an “air gap,” but the composition of gases would be that of theprocess when the void was sealed.

The pinch off sealing may also pinch off the opening in the material fordielectric barrier 910, which is a space between portions of materialfor dielectric barrier 910. This sealing process in forming CT memorycells for memory arrays of a memory device forms and defines a portionof the boundaries of voids 920. As shown in FIG. 9R, in addition tosealing dielectrics 922, voids 920 have a vertical boundary defined bythe material for tunnel region 907 between the material for charge trapregion 905 of adjacent CT structures being formed. The sealing processmay be implemented similar to the process associated with FIG. 1B suchthat the sealing dielectrics end in the region between adjacent materialfor gates 915 prior to reaching the material for the dielectric barrier910.

The structure illustrated in FIG. 9R can be processed to form electricalconnections and to be integrated in an electronic device for which thestructures was formed. In this further processed state, the materialsfor semiconductor pillar 903, tunnel region 907, charge trap region 905,dielectric barrier 910, and gates 915 can be effectively segmented asindividual CT structures as illustrated in FIG. 4 with center of pillar914 filled with dielectric 404. Variations to the processing stagesillustrated in FIGS. 9A-9R can be made to generate alternativestructures to the voids between adjacent CT structures in a stack. Forexample, prior to forming the sealing dielectrics, fin structures of thematerial for dielectric barriers 910 in the regions for the voidregions, shown in FIG. 9Q, can be removed or significantly reduced usingALE. Other variations to the processing stages illustrated in FIGS.9A-9R can be made to generate define the boundaries for voids for themultiple CT structures in a vertical stack.

FIGS. 10A-10D are cross-sectional views illustrating features of stagesof an embodiment of forming multiple CT structures in an electronicdevice. FIG. 10A illustrates a processing stage that begins a variationto the stages of FIGS. 9A-9R. FIG. 10A shows a structure having materialfor semiconductor pillar 1003, material for tunnel region 1007, materialfor charge trap region 1005, material for dielectric blocking region1009, and material for dielectric barrier 1010 in pillar 1014 connectedto material for gates 1015, where these materials are arranged above aconductive region 1013 on substrate 1002. The structures shown in FIG.10A can be formed using processing stages similar or identical to theprocessing stages illustrated in FIGS. 9A-9O.

FIG. 10B shows the structure of FIG. 10A after removal of portions ofmaterial for dielectric blocking region 1009, portions of material forcharge trap region 1005, and portions of material for tunnel region1007, which exposes the material for semiconductor pillar 1003. Thematerial for a semiconductor pillar 1003 may be formed as a doped hollowchannel. The doped hollow channel can be coupled to conductive region1013 via material and/or integrated circuit structures coupled on andcontacting conductive region 1013. For example, the material forsemiconductor pillar 1003 may be semiconductor material deposited toextend to and contact conductive region 1013. Conductive region 1013 canbe formed as a semiconductor region 1013 having a majority carrierconcentration at a concentration level higher than the majority carrierconcentration of semiconductor pillar 1003. Semiconductor region 1013can be formed as a source region. With material for dielectric blockingregion 1009 including an oxide, material for charge trap region 1005including a nitride, and material for tunnel region 1007 including oneor more of oxides and nitrides, removal of the portions of thesematerial regions can include a set of oxide/nitride stack etches toexpose the material for semiconductor pillar 1003.

FIG. 10C shows the structure of FIG. 10B after subjecting the exposedmaterial for semiconductor pillar 1003 to a doping vapor to enhance thedoping of the semiconductor pillar 1003 at regions 1023 of the exposedmaterial for semiconductor pillar 1003. Subjecting the exposed materialfor semiconductor pillar 1003 can include applying phosphine (PH₃) toincrease the carrier doping levels. The phosphine can be applied in ananneal in a temperature range of about 700° C. to about 750° C. Otherannealing temperature ranges may be used. The doping process can provideregion 1023 as an enhanced N⁺ region. Another vapor that can be used inan isotropic vapor anneal is arsine (AsH₃). Other n-type dopants may beused. With semiconductor doping in the various sections for the CTstructures being p-type, p-type dopants may be used, providing region1023 as an enhanced P⁺ region. For a p-type channel, to increase carrierdoping level, a vapor can be applied that provides increased p-typedoping. Applying a vapor anneal with a p-type species can includeapplying diborane (B₂H₆) gas to provide an increase in p-type dopinglevels. For an undoped channel, to increase carrier doping level in theregions of the channel bounded by the tunnel region of the charge trapstructures, a vapor can be applied that provides p-type doping or n-typedoping. The selection of the doping type in the regions of the channelbounded by the tunnel region of the charge trap structures can depend onother features of the integration scheme, for example, the doping schemeof selector devices vertically coupled to the stack of CT structures.Dopants in the regions 1023 of the material for semiconductor pillar1003 between adjacent charge trap structures can be activated withoutdiffusing dopants into the material for semiconductor pillar 1003bounded by the material of tunnel region 1007.

The higher doping levels in regions 1023 can be non-uniform along avertical length of the material for semiconductor pillar 1003 withrespect to the carrier concentration in the material for semiconductorpillar 1003 bounded by the material for tunnel region 1023. The higherdoping levels in regions 1023 can be distributed as a gradient along avertical length of channel 1023 with respect to the carrierconcentration in the material for channel 1023 bounded by the materialfor tunnel region 1007. Such a gradient may be realized with an excessof majority carrier concentration, relative to doping along the materialfor semiconductor pillar 1003 hounded by the material for tunnel region1007, approaching zero at the beginning of the boundary of the materialfor semiconductor pillar 1003 with the material for tunnel region 1007.The higher doping levels in regions 1023 can be distributed as gradientacross the material for semiconductor pillar 1003 in the x-direction,perpendicular to the length of the material semiconductor pillar 1003.

FIG. 10D shows the structure of FIG. 10C after formation of dielectrics1022 to seal voids 1020. Formation of dielectrics 1022 can be conductedselective to the material for gates 1015, the material for dielectricbarrier 1010, and the material for dielectric blocking region 1009 suchthat dielectric 1022 does not interact to change the material for gates1015, the material for dielectric barrier 1010, and the material fordielectric blocking region 1009. Dielectrics 1022 can be formed in a“pinch off” sealing process to seal voids 1020. The sealing process canbe implemented using plasma-enhanced chemical vapor deposition (PECVD)or other depleting process. The pinch off sealing may also pinch off theopening in the material for dielectric barrier 1010, which is a spacebetween portions of material for dielectric barrier 1010. This sealingprocess in forming CT memory cells for memory arrays of a memory deviceforms and defines a portion of the boundaries of voids 1020. As shown inFIG. 10C, in addition to sealing dielectrics 1022, voids 1020 have avertical boundary defined by the material for semiconductor pillar 1003between the material for tunnel regions 1007 of adjacent CT structuresbeing formed. The sealing process may be implemented similar to theprocess associated with FIG. 2B such that the sealing dielectrics end inthe region between adjacent material for gates 1015 prior to reachingthe material for the dielectric barrier 1010.

The structure illustrated in FIG. 10D can be processed to formelectrical connections and to be integrated in an electronic device forwhich the structures were formed. In this further processed state, thematerials for semiconductor pillar 1003, tunnel region 1007, charge trapregion 1005, dielectric barrier 1010, and gates 1015 can be effectivelysegmented as individual CT structures as illustrated in FIG. 5 withcenter of pillar 1014 filled with dielectric 504. Variations to theprocessing stages illustrated in FIGS. 10A-10D can be made to generatealternative structures to the voids between adjacent CT structures in astack. For example, prior to forming the sealing dielectrics, finstructures of the material for dielectric barriers 1010 in the regionsfor the void regions, shown in FIG. 10C, can be removed or significantlyreduced using ALE. Other variations to the processing stages illustratedin FIGS. 10A-10D can be made to generate define the boundaries for voidsfor the multiple CT structures in a vertical stack.

FIG. 11 illustrates an embodiment of an example of a wafer 1100 arrangedto provide multiple electronic components. Wafer 1100 can be provided asa wafer in which a number of dice 1105 can be fabricated. Alternatively,wafer 1100 can be provided as a wafer in which the number of dice 1105have been processed to provide electronic functionality and are awaitingsingulation from wafer 1100 for packaging. Wafer 1100 can be provided asa semiconductor wafer, a semiconductor on insulator wafer, or otherappropriate wafer for processing electronic devices such as anintegrated circuit chips. Wafer 1100 can be fabricated in accordancewith methods associated with any embodiment or combination ofembodiments related to FIGS. 1-10.

Using various masking and processing techniques, each die 1105 can beprocessed to include functional circuitry such that each die 1105 isfabricated as an integrated circuit with the same functionality andpackaged structure as the other dice on wafer 1100. Alternatively, usingvarious masking and processing techniques, various sets of dice 1105 canbe processed to include functional circuitry such that not all of thedice 1105 are fabricated as an integrated circuit with the samefunctionality and packaged structure as the other dice on wafer 1100. Apackaged die having circuits integrated thereon providing electroniccapabilities is herein referred to as an integrated circuit (IC).

Wafer 1100 can comprise multiple dice 1105. Each die 1105 of themultiple dice can include a CT structure. The CT can have or bestructured with respect of a void. The CT and/or multiple CTs can bestructured similar or identical to CTs as taught herein with respect toFIGS. 1-10.

In various embodiments, the CT structure of each die 1105 can include asemiconductor pillar operable to conduct a current; a charge trap regionseparated from the semiconductor pillar by a tunnel region; a dielectricblocking region on the charge trap region; a gate on the dielectricblocking region to control storage of charge in the charge trap region;and a dielectric barrier between and separating the dielectric blockingregion and the gate, the dielectric barrier being disposed in a verticalarrangement with the dielectric blocking region and the charge trapregion such that a void is located between the charge trap region and aregion on which the CT structure is disposed. The dielectric barrier canbe disposed in a vertical arrangement with the dielectric blockingregion and the charge trap region such that a void is located betweenone or more of the dielectric blocking region, the charge trap region,or the tunnel region and a region on which the CT structure is disposed.The charge trap region can be recessed vertically with respect to thedielectric blocking region in the void. The charge trap region can be adielectric nitride region, the dielectric blocking region can be anoxide region, and the tunnel region can include a set of dielectricregions.

The CT structure of each die 1105 can be one of multiple CT structures,including a first CT structure, arranged along a vertical string of anumber of vertical strings, where each charge trap structure, after thefirst CT structure, can be disposed above another one of the multiple CTstructures. Each CT structure along a respective vertical string caninclude: a semiconductor pillar for the CT structure that is a portionof semiconductor material arranged vertically along the vertical stringfor all CT structures along the vertical string; a tunnel regionadjacent and contacting the semiconductor pillar; a charge trap regionadjacent and contacting the tunnel region, the charge trap regionseparated from the charge trap region of an adjacent CT structure in thevertical stack by a void; a dielectric blocking region adjacent andcontacting the charge trap region; and a dielectric barrier between thedielectric blocking region and a gate of the CT structure. The chargetrap region of each CT structure can be recessed vertically with respectto the dielectric blocking region of each CT structure in the void. Thetunnel region of the first CT structure can extend along the pillar ofsemiconductor material and can extend through the other CT structures asthe tunnel region of each CT structure. A dielectric can be disposedbetween gates of adjacent CT structures with the void between theadjacent CT structures bounded by the tunnel region opposite thedielectric. The charge trap region of each CT structure of the multipleCT structures can be a dielectric nitride region, the dielectricblocking region can be an oxide region, and the tunnel region caninclude a set of dielectric regions.

In various embodiments, the CT structure of each die 1105 can include asemiconductor pillar operable to conduct a current; a charge trap regionseparated from the semiconductor pillar by a tunnel region; a dielectricblocking region on the charge trap region; a gate on the dielectricblocking region to control storage of charge in the charge trap region;and a dielectric barrier between the dielectric blocking region and thegate, wherein the tunnel region and the semiconductor pillar arearranged as boundaries of a void. The dielectric barrier, the dielectricblocking region, and the charge trap region can be arranged asboundaries of the void. The semiconductor pillar can include highercarrier doping levels in a region of the semiconductor pillar bounded bythe void than in regions of the semiconductor pillar bounded by thetunnel region. The higher carrier doping levels are n-type doping. Thedielectric barrier can include dielectric material different frommaterial of the dielectric blocking region such that the dielectricmaterial of the dielectric barrier is capable of withstanding materialprocessing for formation of the gate and removal of portions of thecharge trap region and the dielectric blocking region to form the void.

The CT structure of each die 1105 can be one of multiple CT structures,substantially identically structured, and arranged in a vertical stacksuch that the tunnel region of a CT structure is separated from thetunnel region of an adjacent CT structure in the vertical stack by avoid. The CT structures can be arranged in the vertical stack with acommon semiconductor pillar such that regions of the commonsemiconductor pillar between adjacent CT structures have higher carrierdoping levels than regions of the common semiconductor pillar adjacentand contacting the tunnel regions of the CT structures.

In various embodiments, each die 1105 can include a memory device. Thememory device can include a number of vertical strings, where eachvertical string includes a pillar of semiconductor material, andmultiple CT structures, including a first CT structure, arranged alongeach vertical string. The multiple CT structures can be arranged in avertical stack with each CT structure, except for the first CTstructure, disposed above another one of the multiple CT structures.Each CT structure can include: the semiconductor material arranged as achannel for the CT structure; a tunnel region adjacent and contactingthe pillar; a charge trap region adjacent and contacting the tunnelregion; a dielectric blocking region adjacent and contacting the chargetrap region; a dielectric barrier between and separating the dielectricblocking region and a gate of the CT structure, where the tunnel regionis separated from the tunnel region of an adjacent CT structure in thevertical stack by a void. The pillar can include higher carrier dopinglevels in a region of the channel between adjacent CT structures boundedby the void than in regions of the pillar bounded by the tunnel regionof each CT structure. The dielectric barrier of each CT structure caninclude aluminum oxide or one or more of hafnium oxide, zirconium oxide,or mixtures of hafnium oxide and/or zirconium oxide with one or more ofaluminum oxide, silicon oxide, titanium oxide, gadolinium oxide, niobiumoxide, or tantalum oxide. A sealing dielectric can be disposed betweengates of adjacent CT structures providing a seal to the void betweenadjacent CT structures.

FIG. 12 shows a block diagram of an embodiment of an example system 1200that includes a memory 1263 structured with an array of CT structures asmemory cells. The architectures of the CT structures and the memory canbe realized having voids in a manner similar to or identical tostructures in accordance with various embodiments discussed herein.System 1200 can include a controller 1262 operatively coupled to memory1263. System 1200 can also include an electronic apparatus 1267 andperipheral devices 1269. One or more of controller 1262, memory 1263,electronic apparatus 1267, or peripheral devices 1269 can be in the formof one or more ICs.

A bus 1266 provides electrical conductivity between and/or among variouscomponents of system 1200. In an embodiment, bus 1266 can include anaddress bus, a data bus, and a control bus, each independentlyconfigured. In an alternative embodiment, bus 1266 can use commonconductive lines for providing one or more of address, data, or control,the use of which is regulated by controller 1262. Controller 1262 can bein the form or one or more processors.

Electronic apparatus 1267 may include additional memory. Memory insystem 1200 may be constructed as one or more types of memory such as,but not limited to, dynamic random access memory (DRAM), static randomaccess memory (SRAM), synchronous dynamic random access memory (SDRAM),synchronous graphics random access memory (SCRAM), double data ratedynamic ram (DDR), double data rate SDRAM, and magnetic based memory.

Peripheral devices 1269 may include displays, imaging devices, printingdevices, wireless devices, additional storage memory, and controldevices that may operate in conjunction with controller 1262. In variousembodiments, system 1200 includes, but is not limited to, fiber opticsystems or devices, electro-optic systems or devices, optical systems ordevices, imaging systems or devices, and information handling systems ordevices such as wireless systems or devices, telecommunication systemsor devices, and computers.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat any arrangement that is calculated to achieve the same purpose maybe substituted for the specific embodiments shown. Various embodimentsuse permutations and/or combinations of embodiments described herein. Itis to be understood that the above description is intended to beillustrative, and not restrictive, and that the phraseology orterminology employed herein is for the purpose of description. Inaddition, in the foregoing Detailed Description, it can be seen thatvarious features are grouped together in a single embodiment for thepurpose of streamlining the disclosure. This method of disclosure is notto be interpreted as reflecting an intention that the claimedembodiments require more features than are expressly recited in eachclaim. Thus, the following claims are hereby incorporated into theDetailed Description, with each claim standing on its own as a separateembodiment.

What is claimed is:
 1. A method comprising: forming a stack of materialwith an opening surrounded by material to form multiple charge trapstructures of a string of memory cells, including a first charge trapstructure, with each trap structure of the string, except the firstcharge trap structure, disposed above another one of the multiple chargetrap structures of the string; patterning dielectric barrier materialwithin the stack of material by removing portions of the dielectricbarrier material using atomic layer etching from a backside of the stackof material after removing portions of the stack of material; and usingportions of the patterned dielectric barrier material as a mask toremove portions of material of the stack corresponding to dielectricblocking regions and charge trap regions of the charge trap structuressuch that a void is formed between the charge trap regions of adjacentcharge trap structures, the dielectric barrier material separating thedielectric blocking region from a gate in each completed charge trapstructure.
 2. The method of claim 1, wherein patterning the dielectricbarrier material includes repeating deposition and etching of additionaldielectric barrier material until openings in the dielectric barriermaterial attain a size to process the material corresponding todielectric blocking regions.
 3. The method of claim 2, wherein themethod includes using the openings to perform an oxide etch followed bya nitride etch to form the voids.
 4. The method of claim 1, wherein themethod includes, after forming the voids, forming a dielectric in openregions to seal the open regions, the open regions formed by theremoving of portions of the stack of material to pattern the dielectricbarrier material.
 5. The method of claim 1, wherein forming thedielectric in the open regions includes forming the dielectric usingplasma-enhanced chemical vapor deposition.
 6. A method comprising:forming a stack of material with an opening surrounded by material toform tunnel regions, charge trap regions, dielectric blocking regions,and dielectric barriers of multiple charge trap structures of a stringof memory cells, including a first charge trap structure, with eachcharge trap structure of the string of memory cells, after the firstcharge trap structure, disposed above another one of the multiple chargetrap structures of the string; forming multiple gates contactingmaterial for the dielectric barriers and removing material from thestack of material such that each gate is separated from a verticallyadjacent gate of the multiple gates by an open area, exposing portionsof the material for the dielectric barriers; processing material for thedielectric barriers in each open area including applying atomic layeretching to the material for the dielectric barriers to form openings inthe dielectric barriers exposing material for the dielectric blockingregions to the previously opened areas between the gates; removingportions of the material for the dielectric blocking regions verticallyusing the openings in the dielectric harriers, exposing material for thecharge trap regions; and removing portions of the material for thecharge trap regions vertically using the openings in the dielectricbarriers; and after removing portions of the dielectric blocking regionsand charge trap regions, sealing the open areas between the gates toform voids between remaining portions of the charge trap regions ofadjacent charge trap structures.
 7. The method of claim 6, whereinforming multiple gates contacting material for the dielectric barriersand removing material such that each gate is separated from a verticallyadjacent gate of the multiple gates includes removing sacrificialregions adjacent the material for the dielectric harriers using achemistry and process to remove the sacrificial regions substantiallywithout removing material for the dielectric barriers; forming gatematerial in each region in which a sacrificial region is removed; andremoving material of an isolation dielectric from between each gate by achemistry and process to remove the isolation dielectric previouslyformed between adjacent sacrificial regions.
 8. The method of claim 6,wherein processing material for the dielectric barriers in each openarea including applying atomic layer etching to the material for thedielectric barriers includes applying a first atomic layer etching toremove portions of the material for the dielectric barriers using achemistry selective to removing material for the dielectric harrierssubstantially without removing material of the gate or material for thedielectric blocking regions; depositing additional material of thedielectric barriers, after removing portions of the material for thedielectric barriers, on adjacent gates in each open area and on surfacesof material for dielectric blocking regions exposed by the first atomiclayer etching; and applying atomic layer etching to the additionalmaterial for the dielectric barriers providing the openings for theremoving of portions of the dielectric blocking regions.
 9. The methodof claim 6, wherein the method includes removing the portions of thematerial for the dielectric blocking regions and removing the portionsof the material for the charge trap regions such that a distance betweenthe charge trap region of each completed charge trap structure and theregion on which the charge trap structure is disposed is greater than adistance between the dielectric blocking region of each respectivecompleted charge trap structure and the region on which the charge trapstructure is disposed, the dielectric barrier material separating thedielectric blocking region from a gate in each completed charge trapstructure.
 10. The method of claim 9, wherein removing portions of thematerial for the dielectric blocking regions vertically using theopenings in the dielectric barriers includes conducting an etch toremove portions of the material for dielectric blocking regions, andwherein removing portions of the material for the charge trap regionsvertically using the openings in the dielectric barriers includesconducting another etch to remove portions of the material for thecharge trap regions.
 11. The method of claim 9, wherein the methodincludes annealing the stack.
 12. The method of claim 9, wherein sealingthe open areas includes forming a dielectric between the gates of theadjacent charge trap structures.
 13. The method of claim 12, whereinforming the dielectric between the gates of the adjacent charge trapstructures includes forming the dielectric from an entrance to the openareas and terminating the forming of the dielectric prior to reachingthe material for the dielectric barrier, leaving a void between adjacentgates.
 14. The method of claim 6, wherein the method includes removingportions of the tunnel region using the openings the dielectricbarriers, exposing a semiconductor pillar, in addition to removing theportions of the material for the dielectric blocking regions and theportions of the material for the charge trap regions.
 15. The method ofclaim 14, wherein the method includes applying a vapor to the exposedsemiconductor pillar to generate doping to the exposed semiconductorpillar increasing carrier doping levels in a region of the exposedsemiconductor pillar between directly adjacent charge trap structures,the increased carrier doping levels being relative to level of doping inregions of the semiconductor pillar bounded by the tunnel region of thecharge trap structures.
 16. The method of claim 15, wherein applying thevapor includes applying phosphine or arsine to increase the carrierdoping levels.
 17. The method of claim 15, wherein applying the vaporincludes applying diborane gas to increase the carrier doping levels.18. The method of claim 15, wherein, for an undoped semiconductorpillar, applying the vapor includes applying a vapor that providesp-type doping or n-type doping.
 19. The method of claim 15, wherein themethod includes activating dopants in the regions of the semiconductorpillar between adjacent charge trap structures without diffusing dopantsinto the semiconductor pillar bounded by the tunnel region of eachcharge trap structure.
 20. The method of claim 6, wherein the chargetrap regions are nitride regions, the dielectric blocking regions areoxide regions, and the material for the dielectric barriers includesaluminum oxide or a dielectric having a dielectric constant greater thanthat of aluminum oxide.
 21. An apparatus comprising: a semiconductorpillar operable to conduct a current; a charge trap region separatedfrom the semiconductor pillar by a tunnel region; a dielectric blockingregion adjacent to the charge trap region; a gate adjacent to thedielectric blocking region and operable to control storage of charge inthe charge trap region; and a dielectric barrier between the dielectricblocking region and the gate, wherein the tunnel region and thesemiconductor pillar are arranged as boundaries of a void.
 22. Theapparatus of claim 21, wherein the dielectric barrier, the dielectricblocking region, and the charge trap region are arranged as boundariesof the void.
 23. The apparatus of claim 21, wherein the semiconductorpillar includes higher carrier doping levels in a region of thesemiconductor pillar bounded by the void than in regions of thesemiconductor pillar bounded by the tunnel region.
 24. The apparatus ofclaim 23, wherein the higher carrier doping levels are n-type doping.25. The apparatus of claim 23, wherein the apparatus is a die having acharge trap structure, the semiconductor pillar, the tunnel region, thecharge trap region, the dielectric blocking region, the dielectricbarrier, and the gate disposed as part of the charge trap structure. 26.The apparatus of claim 25, wherein the charge trap structure is one of anumber of substantially identically structured charge trap structuresarranged in a vertical stack such that the tunnel region of a chargetrap structure is separated from the tunnel region of an adjacent chargetrap structure in the vertical stack by a void.
 27. The apparatus ofclaim 26, wherein the charge trap structures are arranged in thevertical stack with the semiconductor pillar being common such thatregions of the semiconductor pillar between adjacent charge trapstructures have higher carrier doping levels than regions of thesemiconductor pillar adjacent and contacting the tunnel regions of thecharge trap structures.
 28. The apparatus of claim 21, wherein thedielectric barrier includes dielectric material different from materialof the dielectric blocking region such that the dielectric material ofthe dielectric barrier is capable of withstanding material processingfor formation of the gate and removal of portions of the charge trapregion and the dielectric blocking region to form the void.